Issued Patents All Time
Showing 101–125 of 170 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10720431 | Methods of fabricating semiconductor devices having gate-all-around structure with oxygen blocking layers | Chung-Liang Cheng | 2020-07-21 |
| 10720529 | Source/drain junction formation | Chun Hsiung Tsai, Sheng-Wen Yu | 2020-07-21 |
| 10707320 | Field effect transistors with ferroelectric dielectric materials | Cheng-Ming Lin, Kai Tak Lam, Sai-Hooi Yeong, Chi On Chui | 2020-07-07 |
| 10685867 | Method of semiconductor integrated circuit fabrication | De-Wei Yu, Tsu-Hsiu Perng | 2020-06-16 |
| 10686074 | Fin field effect transistor (FinFET) device structure with doped region in source/drain structure and method for forming the same | Chun Hsiung Tsai, Shahaji B. More, Cheng-Yi Peng, Yu-Ming Lin, Kuo-Feng Yu | 2020-06-16 |
| 10685884 | Semiconductor device including a Fin-FET and method of manufacturing the same | Yasutoshi Okuno, Cheng-Yi Peng, I-Ming Chang, Akira Mineji, Yu-Ming Lin +1 more | 2020-06-16 |
| 10665717 | Semiconductor device and FinFET device | Chun Hsiung Tsai, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2020-05-26 |
| 10629596 | Fin-type field effect transistor structure and manufacturing method thereof | Chun Hsiung Tsai, Tsan-Chun Wang, Kei-Wei Chen | 2020-04-21 |
| 10573749 | Fin-type field effect transistor structure and manufacturing method thereof | Chun Hsiung Tsai, Shiu-Ko JangJian, Kei-Wei Chen, Huai-Tei Yang, Ying-Lang Wang | 2020-02-25 |
| 10541175 | Structure and formation method of semiconductor device with fin structures | Chung-Liang Cheng | 2020-01-21 |
| 10535557 | Interlayer dielectric film in semiconductor devices | Tsan-Chun Wang, De-Wei Yu, Yi-Fan Chen | 2020-01-14 |
| 10515809 | Selective high-K formation in gate-last process | Yasutoshi Okuno, Teng-Chun Tsai, Fu-Ting Yen | 2019-12-24 |
| 10515963 | Field effect transistor contact with reduced contact resistance | Su-Hao Liu, Yan-Ming Tsai, Chung-Ting Wei, Chih-Wei Chang, Chien-Hao Chen +1 more | 2019-12-24 |
| 10490648 | Method to reduce etch variation using ion implantation | Tsan-Chun Wang, Chii-Horng Li, Tze-Liang Lee, Chao-Cheng Chen, Syun-Ming Jang | 2019-11-26 |
| 10483170 | Method of semiconductor integrated circuit fabrication | De-Wei Yu, Chia Ping Lo, Liang-Gi Yao, Weng Chang, Yee-Chia Yeo | 2019-11-19 |
| 10468501 | Gap-filling germanium through selective bottom-up growth | De-Wei Yu, Chien-Hao Chen, Yee-Chia Yeo | 2019-11-05 |
| 10431670 | Source and drain formation technique for fin-like field effect transistor | Chun Hsiung Tsai, Kuo-Feng Yu | 2019-10-01 |
| 10276691 | Conformal transfer doping method for fin-like field effect transistor | Sai-Hooi Yeong, Sheng-Chen Wang, Bo-Yu Lai, Feng-Cheng Yang, Yen-Ming Chen | 2019-04-30 |
| 10269799 | Field effect transistor contact with reduced contact resistance | Su-Hao Liu, Yan-Ming Tsai, Chung-Ting Wei, Chih-Wei Chang, Chien-Hao Chen +1 more | 2019-04-23 |
| 10249530 | Interlayer dielectric film in semiconductor devices | Tsan-Chun Wang, De-Wei Yu, Yi-Fan Chen | 2019-04-02 |
| 10158019 | Source/drain junction formation | Chun Hsiung Tsai, Sheng-Wen Yu | 2018-12-18 |
| 10141417 | Gate structure, semiconductor device and the method of forming semiconductor device | Chun Hsiung Tsai, Kuo-Feng Yu, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2018-11-27 |
| 10115624 | Method of semiconductor integrated circuit fabrication | De-Wei Yu, Tsu-Hsiu Perng | 2018-10-30 |
| 10062780 | FinFET device | Chun Hsiung Tsai, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2018-08-28 |
| 10049918 | Directional patterning methods | Chi-Cheng Hung, Ru-Gun Liu, Wei-Liang Lin, Ta-Ching Yu, Yung-Sung Yen +3 more | 2018-08-14 |