Issued Patents All Time
Showing 76–100 of 170 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11031490 | Fabrication of field effect transistors with ferroelectric materials | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-06-08 |
| 11018022 | Method for forming semiconductor device structure having oxide layer | I-Ming Chang, Chih-Cheng Lin, Chi-Ying Wu, Wei-Ming You, Huang-Lin Chao | 2021-05-25 |
| 11018256 | Selective internal gate structure for ferroelectric semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-05-25 |
| 11007005 | Method of manufacturing a semiconductor device and a semiconductor device | Tung Ying Lee, Yee-Chia Yeo, Meng-Hsuan Hsiao | 2021-05-18 |
| 10985022 | Gate structures having interfacial layers | Chung-Liang Cheng, Chun-I Wu, Huang-Lin Chao | 2021-04-20 |
| 10985265 | Method for forming semiconductor device structure | Chung-Liang Cheng, I-Ming Chang, Hsiang-Pi Chang, Hsueh Wen Tsau, Huang-Lin Chao | 2021-04-20 |
| 10978567 | Gate stack treatment for ferroelectric transistors | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-04-13 |
| 10978357 | Semiconductor arrangement and method of manufacture | I-Ming Chang, Chung-Liang Cheng, Hsiang-Pi Chang, Hsueh Wen Tsau | 2021-04-13 |
| 10971402 | Semiconductor device including interface layer and method of fabricating thereof | Chung-Liang Cheng, I-Ming Chang, Hsiang-Pi Chang, Yu-Wei Lu, Huang-Lin Chao | 2021-04-06 |
| 10964542 | Selective high-K formation in gate-last process | Yasutoshi Okuno, Teng-Chun Tsai, Fu-Ting Yen | 2021-03-30 |
| 10964792 | Dual metal capped via contact structures for semiconductor devices | Chung-Liang Cheng | 2021-03-30 |
| 10923393 | Contacts and interconnect structures in field-effect transistors | Chung-Liang Cheng | 2021-02-16 |
| 10879246 | Methods of fabricating semiconductor devices having gate-all-around structure with oxygen blocking layers | Chung-Liang Cheng | 2020-12-29 |
| 10872970 | Source and drain formation technique for fin-like field effect transistor | Chun Hsiung Tsai, Kuo-Feng Yu | 2020-12-22 |
| 10868171 | Semiconductor device structure with gate dielectric layer and method for forming the same | Chung-Liang Cheng | 2020-12-15 |
| 10868140 | Gap-filling germanium through selective bottom-up growth | De-Wei Yu, Chien-Hao Chen, Yee-Chia Yeo | 2020-12-15 |
| 10868151 | Conformal transfer doping method for fin-like field effect transistor | Sai-Hooi Yeong, Sheng-Chen Wang, Bo-Yu Lai, Feng-Cheng Yang, Yen-Ming Chen | 2020-12-15 |
| 10861751 | Method of semiconductor integrated circuit fabrication | De-Wei Yu, Chia Ping Lo, Liang-Gi Yao, Weng Chang, Yee-Chia Yeo | 2020-12-08 |
| 10854729 | Method to reduce etch variation using ion implantation | Tsan-Chun Wang, Chii-Horng Li, Tze-Liang Lee, Chao-Cheng Chen, Syun-Ming Jang | 2020-12-01 |
| 10854503 | Semiconductor structure with air gap and method sealing the air gap | Hung-Chang Sun, Akira Mineji | 2020-12-01 |
| 10847431 | Ion implantation methods and structures thereof | Tsan-Chun Wang, Chun Hsiung Tsai | 2020-11-24 |
| 10818768 | Method for forming metal cap layers to improve performance of semiconductor structure | Chung-Liang Cheng | 2020-10-27 |
| 10811253 | Methods of fabricating semiconductor devices having crystalline high-K gate dielectric layer | Chung-Liang Cheng | 2020-10-20 |
| 10770563 | Gate structure and patterning method for multiple threshold voltages | Chung-Liang Cheng | 2020-09-08 |
| 10749008 | Gate structure, semiconductor device and the method of forming semiconductor device | Chun Hsiung Tsai, Kuo-Feng Yu, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2020-08-18 |