Issued Patents All Time
Showing 51–75 of 139 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11011385 | CMP-friendly coatings for planar recessing or removing of variable-height layers | Wen-Kuei Liu, Teng-Chun Tsai, Kuo-Yin Lin, Shen-Nan Lee, Yu-Wei Chou +3 more | 2021-05-18 |
| 10707114 | Method of forming isolation layer | Teng-Chun Tsai, Bing Chen, Chien-Hsun Wang, Cheng-Tung Lin, Chih-Tang Peng +3 more | 2020-07-07 |
| 10648689 | Environment control system and method of guiding occupant to make demand response to environment status thereof | Te-Ju Pan, Hua-Yi Hsieh, Yuan-Ping Hsieh | 2020-05-12 |
| 10641513 | Network management system and method for automatic registration of network device thereof | Te-Ju Pan, Hua-Yi Hsieh, Yuan-Ping Hsieh | 2020-05-05 |
| 10515860 | Replacement gate process for semiconductor devices | Yu-Jen Shen, Ying-Ho Chen | 2019-12-24 |
| 10418271 | Method of forming isolation layer | Teng-Chun Tsai, Li-Ting Wang, De-Fang Chen, Cheng-Tung Lin, Chih-Tang Peng +3 more | 2019-09-17 |
| 10325994 | Semiconductor device and method of forming vertical structure | Chih-Tang Peng, Tai-Chun Huang, Teng-Chun Tsai, Cheng-Tung Lin, De-Fang Chen +4 more | 2019-06-18 |
| 10312158 | Method for forming semiconductor device structure with gate structure | Yi-Cheng Li, Chien-Hao Chen, Jr-Jung Lin, Chun-Hung Lee, Chao-Cheng Chen | 2019-06-04 |
| 10269567 | Multi-layer mask and method of forming same | Teng-Chun Tsai, Ying-Tsung Chen, Tien-I Bao | 2019-04-23 |
| 10160091 | CMP polishing head design for improving removal rate uniformity | Te-Chien Hou, Ching-Hong Jiang, Kuo-Yin Lin, Ming-Shiuan She, Shen-Nan Lee +1 more | 2018-12-25 |
| 10144109 | Polisher, polishing tool, and polishing method | Teng-Chun Tsai, Shen-Nan Lee, Chia-Chiung Lo, Shwang-Ming Jeng, Yee-Chia Yeo | 2018-12-04 |
| 9987720 | Method for operating a polishing head and method for polishing a substrate | Shich-Chang Suen, Chin-Hsiang Chan, Liang-Guang Chen | 2018-06-05 |
| 9962801 | Systems and methods for performing chemical mechanical planarization | Shen-Nan Lee, Teng-Chun Tsai | 2018-05-08 |
| 9954069 | Semiconductor device and method of forming vertical structure | Chih-Tang Peng, Tai-Chun Huang, Teng-Chun Tsai, Cheng-Tung Lin, De-Fang Chen +4 more | 2018-04-24 |
| 9917017 | Replacement gate process for semiconductor devices | Yu-Jen Shen, Ying-Ho Chen | 2018-03-13 |
| 9768024 | Multi-layer mask and method of forming same | Teng-Chun Tsai, Ying-Tsung Chen, Tien-I Bao | 2017-09-19 |
| 9748109 | CMP-friendly coatings for planar recessing or removing of variable-height layers | Wen-Kuei Liu, Teng-Chun Tsai, Kuo-Yin Lin, Shen-Nan Lee, Yu-Wei Chou +3 more | 2017-08-29 |
| 9620628 | Methods of forming contact feature | Gin-Chen Huang, Hui-Chi Huang | 2017-04-11 |
| 9478431 | BARC-assisted process for planar recessing or removing of variable-height layers | Wen-Kuei Liu, Teng-Chun Tsai, Kuo-Yin Lin, Shen-Nan Lee, Yu-Wei Chou +3 more | 2016-10-25 |
| 9385034 | Carbonization of metal caps | Hui-Lin Chang, Ting-Yu Shen | 2016-07-05 |
| 9352443 | Platen assembly, chemical-mechanical polisher, and method for polishing substrate | Shich-Chang Suen, Chin-Hsiang Chan, Liang-Guang Chen | 2016-05-31 |
| 9318447 | Semiconductor device and method of forming vertical structure | Chih-Tang Peng, Tai-Chun Huang, Teng-Chun Tsai, Cheng-Tung Lin, De-Fang Chen +4 more | 2016-04-19 |
| 9272386 | Polishing head, and chemical-mechanical polishing system for polishing substrate | Shich-Chang Suen, Chin-Hsiang Chan, Liang-Guang Chen | 2016-03-01 |
| 9236446 | Barc-assisted process for planar recessing or removing of variable-height layers | Wen-Kuei Liu, Teng-Chun Tsai, Kuo-Yin Lin, Shen-Nan Lee, Yu-Wei Chou +3 more | 2016-01-12 |
| 9219036 | Interconnect structure for semiconductor devices | Hui-Lin Chang, Hung Chun Tsai, Syun-Ming Jang | 2015-12-22 |