Issued Patents All Time
Showing 1–25 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12431412 | Contact plugs for semiconductor device and method of forming same | Mrunal A. Khaderbad, Yasutoshi Okuno, Sung-Li Wang, Pang-Yen Tsai, Teng-Chun Tsai | 2025-09-30 |
| 12362281 | Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof | Tsung-Ling Tsai, Mrunal A. Khaderbad, Chung-Wei Hsu, Chen-Hao Wu, Teng-Chun Tsai | 2025-07-15 |
| 12269141 | Fabrication of a polishing pad for chemical mechanical polishing | An-Hsuan Lee, Ming-Shiuan She, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai | 2025-04-08 |
| 12261055 | Slurry compositions for chemical mechanical planarization | An-Hsuan Lee, Chun-Hung Liao, Chen-Hao Wu, Teng-Chun Tsai, Huang-Lin Chao | 2025-03-25 |
| 12176217 | Method for manufacturing a semiconductor using slurry | Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chen-Hao Wu, An-Hsuan Lee +2 more | 2024-12-24 |
| 12024651 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Chun-Hung Liao, An-Hsuan Lee, Teng-Chun Tsai, Chen-Hao Wu, Huang-Lin Chao | 2024-07-02 |
| 11865666 | CMP polishing head design for improving removal rate uniformity | Te-Chien Hou, Ching-Hong Jiang, Kuo-Yin Lin, Ming-Shiuan She, Teng-Chun Tsai +1 more | 2024-01-09 |
| 11776910 | Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof | Tsung-Ling Tsai, Mrunal A. Khaderbad, Chung-Wei Hsu, Chen-Hao Wu, Teng-Chun Tsai | 2023-10-03 |
| 11756825 | Semiconductor structure with oxidized ruthenium | Teng-Chun Tsai, Chen-Hao Wu, Chu-An Lee, Chun-Hung Liao, Tsung-Ling Tsai | 2023-09-12 |
| 11756864 | Contact plugs for semiconductor device | Mrunal A. Khaderbad, Yasutoshi Okuno, Sung-Li Wang, Pang-Yen Tsai, Teng-Chun Tsai | 2023-09-12 |
| 11697183 | Fabrication of a polishing pad for chemical mechanical polishing | An-Hsuan Lee, Ming-Shiuan She, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai | 2023-07-11 |
| 11688607 | Slurry | Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chen-Hao Wu, An-Hsuan Lee +2 more | 2023-06-27 |
| 11529712 | CMP polishing head design for improving removal rate uniformity | Te-Chien Hou, Ching-Hong Jiang, Kuo-Yin Lin, Ming-Shiuan She, Teng-Chun Tsai +1 more | 2022-12-20 |
| 11525072 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | An-Hsuan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao | 2022-12-13 |
| 11495471 | Slurry compositions for chemical mechanical planarization | An-Hsuan Lee, Chun-Hung Liao, Chen-Hao Wu, Teng-Chun Tsai, Huang-Lin Chao | 2022-11-08 |
| 11389928 | Method for conditioning polishing pad | Te-Chien Hou, Teng-Chun Tsai, Chung-Wei Hsu, Chen-Hao Wu | 2022-07-19 |
| 11312882 | CMP slurry solution for hardened fluid material | Kuo-Yin Lin, Wen-Kuei Liu, Teng-Chun Tsai, Kuo-Cheng Lien, Chang-Sheng Lin +1 more | 2022-04-26 |
| 11267987 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Chun-Hung Liao, An-Hsuan Lee, Teng-Chun Tsai, Chen-Hao Wu, Huang-Lin Chao | 2022-03-08 |
| 11120995 | Method for forming multi-layer mask | Chung-Wei Hsu, Yu-Chung Su, Chen-Hao Wu, Tsung-Ling Tsai, Teng-Chun Tsai | 2021-09-14 |
| 11031391 | Method for manufacturing a FinFET device | Kuo-Yin Lin, Pin-Chuan Su, Teng-Chun Tsai | 2021-06-08 |
| 11011385 | CMP-friendly coatings for planar recessing or removing of variable-height layers | Wen-Kuei Liu, Teng-Chun Tsai, Kuo-Yin Lin, Yu-Wei Chou, Kuo-Cheng Lien +3 more | 2021-05-18 |
| 11004794 | Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof | Tsung-Ling Tsai, Mrunal A. Khaderbad, Chung-Wei Hsu, Chen-Hao Wu, Teng-Chun Tsai | 2021-05-11 |
| 11004691 | Mechanism for manufacturing semiconductor device | Chen-Hao Wu, Chung-Wei Hsu, Tsung-Ling Tsai, Teng-Chun Tsai | 2021-05-11 |
| 10964549 | Wafer polishing with separated chemical reaction and mechanical polishing | Teng-Chun Tsai, Chu-An Lee, Chen-Hao Wu, Chun-Hung Liao, Huang-Lin Chao | 2021-03-30 |
| 10920105 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | An-Hsuan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao | 2021-02-16 |