CL

Chu-An Lee

TSMC: 10 patents #2,782 of 12,232Top 25%
NU National Sun Yat-Sen University: 1 patents #156 of 426Top 40%
Overall (All Time): #442,134 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
11942373 Fin isolation structure for FinFET and method of forming the same Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2024-03-26
11756825 Semiconductor structure with oxidized ruthenium Shen-Nan Lee, Teng-Chun Tsai, Chen-Hao Wu, Chun-Hung Liao, Tsung-Ling Tsai 2023-09-12
11688644 Fin isolation structure for FinFET and method of forming the same Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2023-06-27
11282988 Light-emitting device and method of forming the same Tsung-Xian Lee, Wei-Chang Lin, Ming-Chi Chou 2022-03-22
10998239 Fin isolation structure for FinFET and method of forming the same Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2021-05-04
10964549 Wafer polishing with separated chemical reaction and mechanical polishing Shen-Nan Lee, Teng-Chun Tsai, Chen-Hao Wu, Chun-Hung Liao, Huang-Lin Chao 2021-03-30
10847410 Ruthenium-containing semiconductor structure and method of manufacturing the same Shen-Nan Lee, Teng-Chun Tsai, Chen-Hao Wu, Chun-Hung Liao, Tsung-Ling Tsai 2020-11-24
10727076 Slurry and manufacturing semiconductor using the slurry Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chen-Hao Wu, Shen-Nan Lee +2 more 2020-07-28
10714395 Fin isolation structure for FinFET and method of forming the same Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2020-07-14
9333619 Adaptive endpoint method for pad life effect on chemical mechanical polishing Hui-Chi Huang, Peng-Chung Jangjian 2016-05-10
8367429 Adaptive endpoint method for pad life effect on chemical mechanical polishing Hui-Chi Huang, Peng-Chung Jangjian 2013-02-05