CW

Chen-Hao Wu

TSMC: 28 patents #1,233 of 12,232Top 15%
JC Jarllytec Co.: 2 patents #12 of 42Top 30%
Overall (All Time): #121,439 of 4,157,543Top 3%
30
Patents All Time

Issued Patents All Time

Showing 1–25 of 30 patents

Patent #TitleCo-InventorsDate
12362281 Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof Tsung-Ling Tsai, Shen-Nan Lee, Mrunal A. Khaderbad, Chung-Wei Hsu, Teng-Chun Tsai 2025-07-15
12269141 Fabrication of a polishing pad for chemical mechanical polishing An-Hsuan Lee, Ming-Shiuan She, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai 2025-04-08
12261055 Slurry compositions for chemical mechanical planarization An-Hsuan Lee, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao 2025-03-25
12176217 Method for manufacturing a semiconductor using slurry Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, An-Hsuan Lee, Shen-Nan Lee +2 more 2024-12-24
12024651 Chemical mechanical polishing slurry composition and method of polishing metal layer Chun-Hung Liao, An-Hsuan Lee, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao 2024-07-02
11942373 Fin isolation structure for FinFET and method of forming the same Chu-An Lee, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2024-03-26
11776910 Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof Tsung-Ling Tsai, Shen-Nan Lee, Mrunal A. Khaderbad, Chung-Wei Hsu, Teng-Chun Tsai 2023-10-03
11752592 Slurry enhancement for polishing system Chun-Hung Liao, An-Hsuan Lee, Huang-Lin Chao 2023-09-12
11756825 Semiconductor structure with oxidized ruthenium Shen-Nan Lee, Teng-Chun Tsai, Chu-An Lee, Chun-Hung Liao, Tsung-Ling Tsai 2023-09-12
11697183 Fabrication of a polishing pad for chemical mechanical polishing An-Hsuan Lee, Ming-Shiuan She, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai 2023-07-11
11688607 Slurry Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, An-Hsuan Lee, Shen-Nan Lee +2 more 2023-06-27
11688644 Fin isolation structure for FinFET and method of forming the same Chu-An Lee, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2023-06-27
11525072 Materials and methods for chemical mechanical polishing of ruthenium-containing materials An-Hsuan Lee, Shen-Nan Lee, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao 2022-12-13
11495471 Slurry compositions for chemical mechanical planarization An-Hsuan Lee, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao 2022-11-08
11389928 Method for conditioning polishing pad Shen-Nan Lee, Te-Chien Hou, Teng-Chun Tsai, Chung-Wei Hsu 2022-07-19
11267987 Chemical mechanical polishing slurry composition and method of polishing metal layer Chun-Hung Liao, An-Hsuan Lee, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao 2022-03-08
11120995 Method for forming multi-layer mask Chung-Wei Hsu, Yu-Chung Su, Shen-Nan Lee, Tsung-Ling Tsai, Teng-Chun Tsai 2021-09-14
11004691 Mechanism for manufacturing semiconductor device Shen-Nan Lee, Chung-Wei Hsu, Tsung-Ling Tsai, Teng-Chun Tsai 2021-05-11
11004794 Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof Tsung-Ling Tsai, Shen-Nan Lee, Mrunal A. Khaderbad, Chung-Wei Hsu, Teng-Chun Tsai 2021-05-11
10998239 Fin isolation structure for FinFET and method of forming the same Chu-An Lee, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2021-05-04
10964549 Wafer polishing with separated chemical reaction and mechanical polishing Shen-Nan Lee, Teng-Chun Tsai, Chu-An Lee, Chun-Hung Liao, Huang-Lin Chao 2021-03-30
10920105 Materials and methods for chemical mechanical polishing of ruthenium-containing materials An-Hsuan Lee, Shen-Nan Lee, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao 2021-02-16
10847410 Ruthenium-containing semiconductor structure and method of manufacturing the same Shen-Nan Lee, Teng-Chun Tsai, Chu-An Lee, Chun-Hung Liao, Tsung-Ling Tsai 2020-11-24
10727076 Slurry and manufacturing semiconductor using the slurry Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chu-An Lee, Shen-Nan Lee +2 more 2020-07-28
10714395 Fin isolation structure for FinFET and method of forming the same Chu-An Lee, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai, Huang-Lin Chao 2020-07-14