Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12269141 | Fabrication of a polishing pad for chemical mechanical polishing | Ming-Shiuan She, Chen-Hao Wu, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai | 2025-04-08 |
| 12261055 | Slurry compositions for chemical mechanical planarization | Chun-Hung Liao, Chen-Hao Wu, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao | 2025-03-25 |
| 12176217 | Method for manufacturing a semiconductor using slurry | Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chen-Hao Wu, Shen-Nan Lee +2 more | 2024-12-24 |
| 12024651 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai, Chen-Hao Wu, Huang-Lin Chao | 2024-07-02 |
| 11752592 | Slurry enhancement for polishing system | Chun-Hung Liao, Chen-Hao Wu, Huang-Lin Chao | 2023-09-12 |
| 11697183 | Fabrication of a polishing pad for chemical mechanical polishing | Ming-Shiuan She, Chen-Hao Wu, Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai | 2023-07-11 |
| 11688607 | Slurry | Chun-Hung Liao, Chung-Wei Hsu, Tsung-Ling Tsai, Chen-Hao Wu, Shen-Nan Lee +2 more | 2023-06-27 |
| 11525072 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao | 2022-12-13 |
| 11495471 | Slurry compositions for chemical mechanical planarization | Chun-Hung Liao, Chen-Hao Wu, Shen-Nan Lee, Teng-Chun Tsai, Huang-Lin Chao | 2022-11-08 |
| 11267987 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Chun-Hung Liao, Shen-Nan Lee, Teng-Chun Tsai, Chen-Hao Wu, Huang-Lin Chao | 2022-03-08 |
| 10920105 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao | 2021-02-16 |