Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11854898 | Wrap-around contact on FinFET | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2023-12-26 |
| 11718812 | Post-CMP cleaning composition for germanium-containing substrate | Ji Cui, William Weilun Hong, Shich-Chang Suen, Kei-Wei Chen | 2023-08-08 |
| 11694889 | Chemical mechanical polishing cleaning system with temperature control for defect reduction | Ssutzu Chen, Ya-Ting Tsai, Ying-Tsung Chen, Kei-Wei Chen | 2023-07-04 |
| 11362000 | Wrap-around contact on FinFET | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2022-06-14 |
| 10651091 | Wrap-around contact on FinFET | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2020-05-12 |
| 10333001 | Fin structure of FinFET | Ching-Hong Jiang, Neng-Kuo Chen, Sey-Ping Sun, Clement Hsingjen Wann | 2019-06-25 |
| 10269935 | Semiconductor device including Fin-PET and manufacturing method thereof | Tzu-Hsiang Hsu, Chia-Jung Hsu, Feng-Cheng Yang, Teng-Chun Tsai | 2019-04-23 |
| 10269649 | Wrap-around contact on FinFET | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2019-04-23 |
| 10115597 | Self-aligned dual-metal silicide and germanide formation | Chun Hsiung Tsai, Chi-Yuan Shih, Clement Hsingjen Wann, Li-Chi Yu, Chin-Hsiang Lin +6 more | 2018-10-30 |
| 9941367 | Wrap-around contact on FinFET | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2018-04-10 |
| 9929272 | Fin structure of FinFET | Ching-Hong Jiang, Neng-Kuo Chen, Sey-Ping Sun, Clement Hsingjen Wann | 2018-03-27 |
| 9882029 | Semiconductor device including Fin-FET and manufacturing method thereof | Tzu-Hsiang Hsu, Chia-Jung Hsu, Feng-Cheng Yang, Teng-Chun Tsai | 2018-01-30 |
| 9870956 | FinFETs with nitride liners and methods of forming the same | Neng-Kuo Chen, Ching-Hong Jiang, Sey-Ping Sun, Clement Hsingjen Wann | 2018-01-16 |
| 9780214 | Semiconductor device including Fin- FET and manufacturing method thereof | Tzu-Hsiang Hsu, Chia-Jung Hsu, Feng-Cheng Yang, Teng-Chun Tsai | 2017-10-03 |
| 9620628 | Methods of forming contact feature | Hui-Chi Huang, Yung-Cheng Lu | 2017-04-11 |
| 9607826 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Tsai-Fu Hsiao, Ching-Hong Jiang, Neng-Kuo Chen, Hongfa Luan, Sey-Ping Sun +1 more | 2017-03-28 |
| 9559182 | Self-aligned dual-metal silicide and germanide formation | Clement Hsingjen Wann, Sey-Ping Sun, Ling-Yen Yeh, Chi-Yuan Shih, Li-Chi Yu +6 more | 2017-01-31 |
| 9443769 | Wrap-around contact | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2016-09-13 |
| 9443964 | Fin structure of FinFet | Ching-Hong Jiang, Neng-Kuo Chen, Sey-Ping Sun, Clement Hsingjen Wann | 2016-09-13 |
| 9368446 | Self aligned contact formation | Neng-Kuo Chen, Shao-Ming Yu, Chia-Jung Hsu, Sey-Ping Sun, Clement Hsingjen Wann | 2016-06-14 |
| 9214556 | Self-aligned dual-metal silicide and germanide formation | Clement Hsingjen Wann, Sey-Ping Sun, Ling-Yen Yeh, Chi-Yuan Shih, Li-Chi Yu +6 more | 2015-12-15 |
| 9105661 | Fin field effect transistor gate oxide | Neng-Kuo Chen, Hsingjen Wann | 2015-08-11 |
| 9093530 | Fin structure of FinFET | Ching-Hong Jiang, Neng-Kuo Chen, Sey-Ping Sun, Clement Hsingjen Wann | 2015-07-28 |
| 9006802 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Tsai-Fu Hsiao, Ching-Hong Jiang, Neng-Kuo Chen, Hongfa Luan, Sey-Ping Sun +1 more | 2015-04-14 |
| 8940597 | In-situ metal gate recess process for self-aligned contact application | Chia-Jung Hsu, Yi-An Lin, Neng-Kuo Chen, Sey-Ping Sun, Clement Hsingjen Wann | 2015-01-27 |