Issued Patents All Time
Showing 101–122 of 122 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8530121 | Multiple-grid exposure method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2013-09-10 |
| 8524427 | Electron beam lithography system and method for improving throughput | Jaw-Jung Shin, Wen-Chuan Wang, Burn Jeng Lin | 2013-09-03 |
| 8510687 | Error diffusion and grid shift in lithography | Pei-Yi Liu, Wen-Chuan Wang, Jaw-Jung Shin, Burn Jeng Lin | 2013-08-13 |
| 8464186 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Jeng-Horng Chen, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2013-06-11 |
| 8378319 | System and method for generating direct-write pattern | Faruk Krecinic, Jeng-Horng Chen, Shih-Ming Chang, Tuane Ying Fang, Wei-Long Wang +1 more | 2013-02-19 |
| 8368037 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Jaw-Jung Shin, Burn Jeng Lin | 2013-02-05 |
| 8199314 | System and method for improving immersion scanner overlay performance | Jui-Chung Peng, Tzung-Chi Fu, Chin-Hsiang Lin, Chien-Hsun Lin, Chun-Hung Lin +2 more | 2012-06-12 |
| 8178280 | Self-contained proximity effect correction inspiration for advanced lithography (special) | Shih-Ming Chang | 2012-05-15 |
| 8143602 | High-volume manufacturing massive e-beam maskless lithography system | Jeng-Horng Chen, Burn Jeng Lin | 2012-03-27 |
| 8068208 | System and method for improving immersion scanner overlay performance | Jui-Chung Peng, Tzung-Chi Fu, Chin-Hsiang Lin, Chien-Hsun Lin, Chun-Hung Lin +2 more | 2011-11-29 |
| 7851774 | System and method for direct writing to a wafer | Burn Jeng Lin, Jeng-Horng Chen, Tsai-Sheng Gau | 2010-12-14 |
| 7795601 | Method and apparatus to improve lithography throughput | Chin-Hsiang Lin, Jui-Chung Peng, Yung-Cheng Chen | 2010-09-14 |
| 7796249 | Mask haze early detection | Wen-Chuan Wang, Te-Chih Huang, Chih-Ming Ke, Wei-Yu Su, Heng-Hsin Liu +2 more | 2010-09-14 |
| 7571021 | Method and system for improving critical dimension uniformity | Chun-Hung Lin, Heng-Hsin Liu, Chien-Hsun Lin, Jui-Chung Peng, Yao-Wen Guo | 2009-08-04 |
| 7381344 | Method to reduce particle level for dry-etch | Sheng-Chi Chin | 2008-06-03 |
| 6799312 | Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer making | Fei-Gwo Tsai | 2004-09-28 |
| 6599665 | Method of making a semiconductor wafer imaging mask having uniform pattern features | Sheng-Chi Chin | 2003-07-29 |
| 6428938 | Phase-shift mask for printing high-resolution images and a method of fabrication | Chin-Hsiang Lin, Sheng-Chi Chin, Wei-Zen Chou | 2002-08-06 |
| 6379849 | Method for forming binary intensity masks | Wen-Chuan Wang | 2002-04-30 |
| 6134014 | Apparatus and method of inspecting phase shift masks using comparison of a mask die image to the mask image database | San-De Tzu | 2000-10-17 |
| 6018392 | Apparatus and method for inspecting phase shifting masks | San-De Tzu | 2000-01-25 |
| 6007324 | Double layer method for fabricating a rim type attenuating phase shifting mask | San-De Tzu, Ching-Chia Lin | 1999-12-28 |