Issued Patents All Time
Showing 76–100 of 122 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9529271 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Pei-Yi Liu | 2016-12-27 |
| 9519225 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-12-13 |
| 9436787 | Method of fabricating an integrated circuit with optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Burn Jeng Lin | 2016-09-06 |
| 9436788 | Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity | Jyuh-Fuh Lin, Pei-Yi Liu, Cheng-Hung Chen, Wen-Chuan Wang, Burn Jeng Lin | 2016-09-06 |
| 9418191 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Jeng-Horng Chen, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2016-08-16 |
| 9390891 | Apparatus for charged particle lithography system | Shih-Chi Wang, Tsung-Chih Chien, Hui-Min Huang, Jaw-Jung Shin, Burn Jeng Lin | 2016-07-12 |
| 9329488 | Grid refinement method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2016-05-03 |
| 9291913 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Burn Jeng Lin | 2016-03-22 |
| 9229332 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2016-01-05 |
| 9182660 | Methods for electron beam patterning | Wen-Chuan Wang, Jaw-Jung Shin, Burn Jeng Lin | 2015-11-10 |
| 9176389 | Grid refinement method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2015-11-03 |
| 9134627 | Multiple-patterning overlay decoupling method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2015-09-15 |
| 9001308 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Burn Jeng Lin | 2015-04-07 |
| 8984452 | Long-range lithographic dose correction | Cheng-Hung Chen, Jaw-Jung Shin, Wen-Chuan Wang, Pei-Yi Liu, Burn Jeng Lin | 2015-03-17 |
| 8972908 | Method for electron beam proximity correction with improved critical dimension accuracy | Cheng-Hung Chen, Jaw-Jung Shin, Wen-Chuan Wang, Pei-Yi Liu, Burn Jeng Lin | 2015-03-03 |
| 8927947 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Jaw-Jung Shin, Burn Jeng Lin | 2015-01-06 |
| 8852849 | Electron beam lithography system and method for improving throughput | Jaw-Jung Shin, Wen-Chuan Wang, Burn Jeng Lin | 2014-10-07 |
| 8846278 | Electron beam lithography system and method for improving throughput | Jaw-Jung Shin, Wen-Chuan Wang, Burn Jeng Lin | 2014-09-30 |
| 8828632 | Multiple-grid exposure method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2014-09-09 |
| 8822107 | Grid refinement method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2014-09-02 |
| 8822106 | Grid refinement method | Wen-Chuan Wang, Pei-Yi Liu, Jaw-Jung Shin, Burn Jeng Lin | 2014-09-02 |
| 8762900 | Method for proximity correction | Jaw-Jung Shin, Hua-Tai Lin, Burn Jeng Lin | 2014-06-24 |
| 8722286 | Devices and methods for improved reflective electron beam lithography | Chen-Hua Yu, Jaw-Jung Shin, Burn Jeng Lin | 2014-05-13 |
| 8610083 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Jaw-Jung Shin, Burn Jeng Lin | 2013-12-17 |
| 8584057 | Non-directional dithering methods | Pei-Yi Liu, Wen-Chuan Wang, Jaw-Jung Shin, Burn Jeng Lin | 2013-11-12 |