Issued Patents All Time
Showing 176–200 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7537880 | Polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Takao Yoshihara, Wataru Kusaki, Tomohiro Kobayashi | 2009-05-26 |
| 7531289 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Takeshi Kinsho, Takeru Watanabe, Masaki Ohashi, Seiichiro Tachibana | 2009-05-12 |
| 7527912 | Photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Takeru Watanabe, Masaki Ohashi | 2009-05-05 |
| 7485408 | Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process | Takeshi Kinsho, Mutsuo Nakashima, Takeru Watanabe | 2009-02-03 |
| 7392814 | Substrate processing apparatus and method | Masato Tanaka, Ayumi HIGUCHI, Kenichiro Arai | 2008-07-01 |
| 7378548 | Tertiary amine compounds having an ester structure and processes for preparing the same | Takeru Watanabe, Takeshi Kinsho, Jun Hatakeyama | 2008-05-27 |
| 7276324 | Nitrogen-containing organic compound, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Katsuya Takemura, Kazumi Noda, Katsuhiro Kobayashi | 2007-10-02 |
| 7267128 | Substrate treating apparatus | Toshio Hiroe, Ichiro Mitsuyoshi, Yoshihiro Nishina | 2007-09-11 |
| 7266140 | GPS positioning method and GPS reception apparatus | Mikio Wakamori, Haruo Kanetsuna | 2007-09-04 |
| 7261995 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | Takeru Watanabe, Katsuya Takemura, Kazumi Noda | 2007-08-28 |
| 7243911 | Substrate treating apparatus | Yoshitaka Abiko, Tomonori Kojimaru, Keiji MAGARA, Toshio Hiroe | 2007-07-17 |
| 7192684 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | Takeshi Kinsho, Takeru Watanabe | 2007-03-20 |
| 7169541 | Compound, polymer, resist composition, and patterning process | Takeshi Kinsho | 2007-01-30 |
| 7160416 | Substrate treating apparatus | Akira Morita, Kenichiro Arai | 2007-01-09 |
| 7141351 | Basic compound, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho | 2006-11-28 |
| 7141352 | Basic compound, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho | 2006-11-28 |
| 7135270 | Resist polymer, resist composition and patterning process | Takeru Watanabe, Tsunehiro Nishi, Junji Tsuchiya, Kenji Funatsu | 2006-11-14 |
| 7132215 | Ester compounds, polymers, resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2006-11-07 |
| 7109828 | Surface acoustic wave device, and mobile communication device and sensor both using same | Ryoichi Takayama, Shunichi Seki, Tetsuo Kawasaki, Hidekazu Nakanishi | 2006-09-19 |
| 7084303 | Tertiary amine compounds having an ester structure and processes for preparing same | Takeru Watanabe, Takeshi Kinsho, Jun Hatakeyama | 2006-08-01 |
| 7075390 | Surface acoustic wave device | Akihiro Bungo, Ryohei Kimura, Masanori Koshiba | 2006-07-11 |
| 7037995 | Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process | Takeru Watanabe, Takeshi Kinsho | 2006-05-02 |
| 7029822 | Tertiary alcohol compounds having alicyclic structure | Takeru Watanabe, Takeshi Kinsho | 2006-04-18 |
| 6962767 | Acetal compound, polymer, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2005-11-08 |
| 6899990 | Epoxy compound having alicyclic structure, polymer, resist composition and patterning process | Takeshi Kinsho, Takeru Watanabe, Tsunehiro Nishi | 2005-05-31 |