Issued Patents All Time
Showing 151–175 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8211618 | Positive resist composition and patterning process | Jun Hatakeyama, Seiichiro Tachibana | 2012-07-03 |
| 8158330 | Resist protective coating composition and patterning process | Yuji Harada, Jun Hatakeyama, Satoshi Shinachi | 2012-04-17 |
| 8114570 | Photoacid generator, resist composition, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe, Masaki Ohashi | 2012-02-14 |
| 8101335 | Resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Kazunori Maeda, Satoshi Shinachi | 2012-01-24 |
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Tsunehiro Nishi, Takeshi Kinsho, Seiichiro Tachibana, Takeru Watanabe | 2011-11-22 |
| 8053165 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Takeshi Kinsho, Masaki Ohashi, Takeru Watanabe | 2011-11-08 |
| 7985528 | Positive resist composition and patterning process | Tsunehiro Nishi, Takeshi Kinsho, Masaki Ohashi, Masashi Iio | 2011-07-26 |
| 7981589 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Takeshi Kinsho, Katsuhiro Kobayashi, Tsunehiro Nishi, Takeru Watanabe | 2011-07-19 |
| 7906701 | p300 transgenic animal | Yosuke Kawase, Hiroshi Suzuki | 2011-03-15 |
| 7875417 | Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Toshiharu Yano | 2011-01-25 |
| 7871752 | Lactone-containing compound, polymer, resist composition, and patterning process | Tsunehiro Nishi, Takeshi Kinsho, Seiichiro Tachibana | 2011-01-18 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Takeshi Kinsho, Tsunehiro Nishi, Masaki Ohashi, Takeru Watanabe | 2011-01-11 |
| 7836842 | Coating apparatus | Hiroshi Matuura, Yasukazu Nishimura | 2010-11-23 |
| 7833694 | Lactone-containing compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Katsuhiro Kobayashi, Tsunehiro Nishi, Takeshi Kinsho | 2010-11-16 |
| RE41580 | Lactone-containing compounds, polymers, resist compositions, and patterning method | Tsunehiro Nishi, Takeshi Kinsho, Jun Hatakeyama, Osamu Watanabe | 2010-08-24 |
| 7758717 | Wafer treating apparatus | Akira Morita, Kenichiro Arai | 2010-07-20 |
| 7741015 | Patterning process and resist composition | Jun Hatakeyama, Takao Yoshihara, Takeshi Kinsho, Yoshio Kawai, Katsuya Takemura | 2010-06-22 |
| 7718342 | Polymers, resist compositions and patterning process | Kenji Funatsu, Tomohiro Kobayashi, Tsunehiro Nishi | 2010-05-18 |
| 7687222 | Polymerizable ester compounds, polymers, resist compositions and patterning process | Takeru Watanabe, Takeshi Kinsho, Seiichiro Tachibana, Masaki Ohashi | 2010-03-30 |
| 7678530 | Lactone-containing compound, polymer, resist composition, and patterning process | Satoshi Watanabe, Jun Hatakeyama, Takeshi Kinsho, Seiichiro Tachibana | 2010-03-16 |
| 7670750 | Polymer, resist protective coating material, and patterning process | Yuji Harada, Jun Hatakeyama | 2010-03-02 |
| 7642034 | Polymer, resist protective coating material, and patterning process | Jun Hatakeyama, Yuji Harada | 2010-01-05 |
| 7629106 | Resist composition and patterning process using the same | Jun Hatakeyama, Youichi Ohsawa, Seiichiro Tachibana | 2009-12-08 |
| 7622242 | Resist composition and patterning process | Jun Hatakeyama, Takeru Watanabe, Yuji Harada | 2009-11-24 |
| 7614359 | Coating apparatus | Hiroshi Matsuura, Tetsuya Murakami, Takashi Sakamoto | 2009-11-10 |