Issued Patents All Time
Showing 126–150 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8835094 | Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process | Takeru Watanabe, Tomohiro Kobayashi, Takeshi Kinsho | 2014-09-16 |
| 8808966 | Positive resist composition and patterning process | Jun Hatakeyama | 2014-08-19 |
| 8795946 | Polymerizable ester compound, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Yuuki Suka, Masashi Ilo | 2014-08-05 |
| 8791290 | Acetal compound, polymer, resist composition, and patterning process | Jun Hatakeyama, Takeshi Nagata, Seiichiro Tachibana, Takeshi Kinsho | 2014-07-29 |
| 8791288 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | Takeshi Kinsho, Tomohiro Kobayashi, Masayoshi Sagehashi, Takeru Watanabe, Seiichiro Tachibana | 2014-07-29 |
| 8753805 | Patterning process and resist composition | Jun Hatakeyama, Tomohiro Kobayashi | 2014-06-17 |
| 8735046 | Positive resist composition and patterning process | Jun Hatakeyama | 2014-05-27 |
| 8703408 | Patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2014-04-22 |
| 8697903 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | Takeshi Kinsho, Yuuki Suka, Yuji Harada, Takeshi Sasami | 2014-04-15 |
| 8686166 | Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom | Masayoshi Sagehashi, Takeru Watanabe, Youichi Ohsawa, Masaki Ohashi | 2014-04-01 |
| 8671877 | Coating apparatus | Takuya Nagato, Koh Matsui | 2014-03-18 |
| 8652750 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Toshiharu Yano | 2014-02-18 |
| 8647808 | Fluorinated monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Takeshi Sasami | 2014-02-11 |
| 8597869 | Sulfonium salt, resist composition, and patterning process | Masayoshi Sagehashi, Youichi Ohsawa, Takeshi Kinsho, Tomohiro Kobayashi | 2013-12-03 |
| 8574817 | Positive resist composition and patterning process | Jun Hatakeyama | 2013-11-05 |
| 8501386 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | Tsutomu Ogihara, Takafumi Ueda, Toshiharu Yano | 2013-08-06 |
| 8492078 | Patterning process | Jun Hatakeyama, Takeshi Nagata | 2013-07-23 |
| 8450042 | Positive resist composition and patterning process | Jun Hatakeyama, Seiichiro Tachibana | 2013-05-28 |
| 8440386 | Patterning process, resist composition, and acetal compound | Jun Hatakeyama, Takeshi Nagata | 2013-05-14 |
| 8431323 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Yuji Harada, Jun Hatakeyama +2 more | 2013-04-30 |
| 8420290 | Acetal compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeshi Kinsho, Tsunehiro Nishi, Masayoshi Sagehashi | 2013-04-16 |
| 8420292 | Polymer, resist composition, and patterning process | Yuji Harada, Takeru Watanabe, Takeshi Sasami, Yuuki Suka | 2013-04-16 |
| 8361703 | Resist protective coating composition and patterning process | Yuji Harada, Jun Hatakeyama | 2013-01-29 |
| 8313886 | Resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Tomohiro Kobatashi | 2012-11-20 |
| 8268528 | Resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Kazunori Maeda, Tomohiro Kobayashi | 2012-09-18 |