Issued Patents All Time
Showing 76–100 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9618850 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Kenji Funatsu | 2017-04-11 |
| 9601229 | Conductive polymer composite comprising a sulfo group-containing dopant polymer | Jun Hatakeyama, Takayuki Nagasawa | 2017-03-21 |
| 9595362 | Conductive polymer composition comprising a sulfo group-containing dopant polymer | Jun Hatakeyama, Takayuki Nagasawa | 2017-03-14 |
| 9587137 | Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate | Takayuki Nagasawa, Jun Hatakeyama | 2017-03-07 |
| 9551932 | Patterning process and resist composition | Kenji Funatsu, Kentaro Kumaki, Akihiro Seki, Tomohiro Kobayashi | 2017-01-24 |
| 9535325 | Onium salt, chemically amplified positive resist composition, and patterning process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima | 2017-01-03 |
| 9527937 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Masayoshi Sagehashi, Masaki Ohashi | 2016-12-27 |
| 9493597 | Polymer compound having a specific super strongly acidic sulfo group | Jun Hatakeyama, Takayuki Nagasawa | 2016-11-15 |
| 9482949 | Positive resist composition and patterning process | Jun Hatakeyama | 2016-11-01 |
| 9458144 | Monomer, polymer, resist composition, and patterning process | Takayuki Fujiwara, Masayoshi Sagehashi, Ryosuke Taniguchi | 2016-10-04 |
| 9442376 | Positive resist composition and patterning process | Jun Hatakeyama | 2016-09-13 |
| 9429843 | Positive resist composition and patterning process | Jun Hatakeyama | 2016-08-30 |
| 9411225 | Photo acid generator, chemically amplified resist composition, and patterning process | Masaki Ohashi, Masahiro Fukushima, Kenichi Oikawa | 2016-08-09 |
| 9377689 | Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film | Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Takayuki Fujiwara | 2016-06-28 |
| 9335633 | Positive resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2016-05-10 |
| 9335632 | Positive resist composition and patterning process | Jun Hatakeyama | 2016-05-10 |
| 9310683 | Monomer, polymer, positive resist composition and patterning process | Jun Hatakeyama | 2016-04-12 |
| 9266142 | Coating device | Yasuhiro Hotta, Naotoshi Kinoshita, Tarou Endou, Shuichiro Fukuda, Kazuhiro Uchida +3 more | 2016-02-23 |
| 9261783 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | Takeshi Kinsho, Yuuki Suka, Yuji Harada, Takeshi Sasami | 2016-02-16 |
| 9256127 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Takayuki Fujiwara, Ryosuke Taniguchi | 2016-02-09 |
| 9250517 | Polymer, positive resist composition and patterning process | Masayoshi Sagehashi, Jun Hatakeyama | 2016-02-02 |
| 9250522 | Positive resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2016-02-02 |
| 9235122 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Kazuhiro Katayama | 2016-01-12 |
| 9213235 | Patterning process, resist composition, polymer, and monomer | Masayoshi Sagehashi, Kazuhiro Katayama, Tomohiro Kobayashi | 2015-12-15 |
| 9182668 | Patterning process, resist composition, polymer, and monomer | Masayoshi Sagehashi, Tomohiro Kobayashi, Kazuhiro Katayama | 2015-11-10 |