Issued Patents All Time
Showing 26–50 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11071485 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | Jun Hatakeyama, Osamu Watanabe, Motoaki Iwabuchi | 2021-07-27 |
| 11015974 | Measurement device | Takashi Toyoda | 2021-05-25 |
| 11009793 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Masayoshi Sagehashi, Teppei Adachi, Kazuhiro Katayama | 2021-05-18 |
| 10948822 | Resist composition and patterning process | Jun Hatakeyama, Masahiro Fukushima | 2021-03-16 |
| 10934463 | Adhesive film, method for forming an adhesive film, and urethane polymer | Jun Hatakeyama, Motoaki Iwabuchi, Keisuke NIIDA | 2021-03-02 |
| 10915021 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Jun Hatakeyama | 2021-02-09 |
| 10851188 | Polymer compound for conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Fujiwara, Takayuki Nagasawa | 2020-12-01 |
| 10816900 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Kenji Funatsu | 2020-10-27 |
| 10800916 | Stretchable film composition, stretchable film, and method for forming the same | Jun Hatakeyama, Motoaki Iwabuchi, Shiori Nonaka | 2020-10-13 |
| 10661238 | Continuous particle manufacturing device | Koji Hisazumi, Takuya Nagato, Makoto Kobayashi | 2020-05-26 |
| 10591819 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Masayoshi Sagehashi, Jun Hatakeyama, Kazuhiro Katayama | 2020-03-17 |
| 10559397 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2020-02-11 |
| 10527939 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Masayoshi Sagehashi, Jun Hatakeyama, Kazuhiro Katayama | 2020-01-07 |
| 10457779 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi | 2019-10-29 |
| 10424896 | Laser light source module and method of specifying failure laser diode | — | 2019-09-24 |
| 10363555 | Polymer compound for conductive polymer and method for producing the same | Jun Hatakeyama, Masaki Ohashi, Masayoshi Sagehashi, Takayuki Nagasawa | 2019-07-30 |
| 10310376 | Resist composition, pattern forming process, polymer, and monomer | Teppei Adachi, Ryosuke Taniguchi, Kenji Yamada | 2019-06-04 |
| 10308735 | Material for organic light-emitting device and organic light-emitting device including the same | Masashi Tsuji, Makoto Taguchi | 2019-06-04 |
| 10303056 | Resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2019-05-28 |
| 10286514 | Spindle condition detection device for machine tool | Koji Kito, Takashi Matsui, Nobumitsu Hori, Osamu Higashimoto | 2019-05-14 |
| 10216085 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi | 2019-02-26 |
| 10203601 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Kenji Funatsu | 2019-02-12 |
| 10131730 | Resist composition and patterning process | Takayuki Fujiwara, Masayoshi Sagehashi, Kenichi Oikawa | 2018-11-20 |
| 10125202 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Masaki Ohashi, Takayuki Nagasawa | 2018-11-13 |
| 10126649 | Resist composition and patterning process using the same | Jun Hatakeyama, Masayoshi Sagehashi | 2018-11-13 |