Issued Patents All Time
Showing 51–75 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10114287 | Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate | Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Masahiro Fukushima, Takayuki Fujiwara | 2018-10-30 |
| 10025180 | Sulfonium compound, resist composition, and patterning process | Ryo MITSUI, Takayuki Fujiwara, Ryosuke Taniguchi, Masaki Ohashi | 2018-07-17 |
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Teppei Adachi, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 10020089 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2018-07-10 |
| 10012903 | Resist composition and pattern forming process | Jun Hatakeyama | 2018-07-03 |
| 10005868 | Resist composition and patterning process using the same | Jun Hatakeyama | 2018-06-26 |
| 9991019 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2018-06-05 |
| 9969829 | Polymer compound, negative resist composition, laminate, patterning process, and compound | Daisuke Domon, Keiichi Masunaga, Masaaki Kotake | 2018-05-15 |
| 9904172 | Shrink material and pattern forming process | Kentaro Kumaki, Satoshi Watanabe, Daisuke Domon, Kenji Yamada | 2018-02-27 |
| D803911 | Programmable controller | Kazuma SUZUKI, Yasunori Tsuboi, Sutemaro Kato | 2017-11-28 |
| 9829792 | Monomer, polymer, positive resist composition, and patterning process | Jun Hatakeyama, Teppei Adachi | 2017-11-28 |
| D803281 | Programmable controller | Kazuma SUZUKI, Yasunori Tsuboi, Sutemaro Kato | 2017-11-21 |
| D803280 | Programmable controller | Kazuma SUZUKI, Yasunori Tsuboi, Sutemaro Kato | 2017-11-21 |
| 9810983 | Polymer, chemically amplified positive resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2017-11-07 |
| 9793653 | Controller unit | Kazuhiro Sugita, Yasunori Tsuboi, Sutemaro Kato | 2017-10-17 |
| 9790166 | Polymer, monomer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Jun Hatakeyama, Kazuhiro Katayama | 2017-10-17 |
| 9777093 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Fujiwara, Takayuki Nagasawa | 2017-10-03 |
| 9758609 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Kazuhiro Katayama, Jun Hatakeyama | 2017-09-12 |
| 9752045 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2017-09-05 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Ryosuke Taniguchi | 2017-08-22 |
| 9720324 | Resist composition and pattern forming process | Jun Hatakeyama | 2017-08-01 |
| 9709890 | Resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi, Daisuke Domon | 2017-07-18 |
| 9663593 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Masaki Ohashi, Masayoshi Sagehashi | 2017-05-30 |
| 9657115 | Polymer compound for a conductive polymer and method for manufacturing same | Jun Hatakeyama, Takayuki Nagasawa, Masayoshi Sagehashi | 2017-05-23 |
| 9632415 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Masayoshi Sagehashi | 2017-04-25 |