Issued Patents All Time
Showing 101–125 of 257 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9178426 | Three-phase alternating-current power supply switching circuit | — | 2015-11-03 |
| 9140988 | Positive resist composition, monomer, polymer, and patterning process | Jun Hatakeyama, Masaki Ohashi | 2015-09-22 |
| 9115074 | Fluorinated monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Takeshi Sasami | 2015-08-25 |
| 9104105 | Patterning process and resist composition | Jun Hatakeyama, Tomohiro Kobayashi | 2015-08-11 |
| 9086628 | Resist protective film-forming composition and patterning process | Yuuki Suka, Yuji Harada | 2015-07-21 |
| 9086624 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Jun Hatakeyama | 2015-07-21 |
| 9081290 | Patterning process and resist composition | Jun Hatakeyama, Masayoshi Sagehashi, Kazuhiro Katayama, Kentaro Kumaki, Tomohiro Kobayashi | 2015-07-14 |
| 9075308 | Positive resist composition and patterning process | Jun Hatakeyama | 2015-07-07 |
| 9046772 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Kazuhiro Katayama | 2015-06-02 |
| 9040223 | Resist composition, patterning process and polymer | Jun Hatakeyama, Kenji Funatsu | 2015-05-26 |
| 9040222 | Polymerizable tertiary ester compound, polymer, resist composition, and patterning process | Yuki Suka, Jun Hatakeyama | 2015-05-26 |
| 9027577 | Nozzle and a substrate processing apparatus including the same | Naoyuki Osada, Masashi Sawamura | 2015-05-12 |
| 9023587 | Negative resist composition and patterning process | Jun Hatakeyama, Daisuke Domon | 2015-05-05 |
| 9017918 | Monomer, polymer, chemically amplified positive resist composition, and patterning process | Jun Hatakeyama, Seiichiro Tachibana | 2015-04-28 |
| 9017931 | Patterning process and resist composition | Jun Hatakeyama, Masayoshi Sagehashi, Teppei Adachi | 2015-04-28 |
| 8999630 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama | 2015-04-07 |
| 8945809 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | Masayoshi Sagehashi, Taku Morisawa, Yuji Harada, Takao Yoshihara | 2015-02-03 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Yuji Harada, Jun Hatakeyama +2 more | 2015-01-13 |
| 8921025 | Positive resist compositions and patterning process | Tatsushi Kaneko, Tsunehiro Nishi | 2014-12-30 |
| 8924172 | Power consumption display unit for machine tool | Hirotaka Sugiura, Takeshi Kojima | 2014-12-30 |
| 8916331 | Resist composition and patterning process | Takeshi Sasami, Yuji Harada, Taku Morisawa | 2014-12-23 |
| 8900793 | Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition | Masayoshi Sagehashi, Youichi Ohsawa, Tomohiro Kobayashi | 2014-12-02 |
| 8877424 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Jun Hatakeyama, Kazuhiro Katayama | 2014-11-04 |
| 8865390 | Patterning process and resist composition | Jun Hatakeyama, Kazuhiro Katayama | 2014-10-21 |
| 8841061 | Positive resist composition and patterning process | Jun Hatakeyama | 2014-09-23 |