KH

Koji Hasegawa

SC Shin-Etsu Chemical Co.: 212 patents #3 of 2,176Top 1%
DC Dainippon Screen Mfg. Co.: 6 patents #119 of 977Top 15%
SO Sony: 6 patents #6,793 of 25,231Top 30%
JT Jtekt: 6 patents #275 of 1,969Top 15%
KP Kabushiki Kaisha Powrex: 5 patents #1 of 28Top 4%
Mitsubishi Electric: 3 patents #8,691 of 25,717Top 35%
RJ Research Development Corporation Of Japan: 3 patents #41 of 402Top 15%
TO Toyota: 2 patents #10,861 of 26,838Top 45%
SP Sakai Display Products: 2 patents #82 of 175Top 50%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
Samsung: 1 patents #49,284 of 75,807Top 70%
NM Nisshin Oil Mills: 1 patents #49 of 101Top 50%
ED Eudyna Devices: 1 patents #37 of 80Top 50%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
MM Mitsubishi Materials: 1 patents #812 of 1,543Top 55%
NA Nabtesco: 1 patents #159 of 320Top 50%
NC N.E. Chemcat: 1 patents #64 of 136Top 50%
CP Chugai Pharmaceutical: 1 patents #730 of 1,238Top 60%
SC Screen Holdings Co.: 1 patents #452 of 686Top 70%
SK Showa Denko K.K.: 1 patents #940 of 1,736Top 55%
📍 Joetsu, JP: #3 of 239 inventorsTop 2%
Overall (All Time): #1,860 of 4,157,543Top 1%
257
Patents All Time

Issued Patents All Time

Showing 226–250 of 257 patents

Patent #TitleCo-InventorsDate
6509135 Polymer, resist composition and patterning process Tsunehiro Nishi, Takeru Watanabe, Takeshi Kinsho, Jun Hatakeyama 2003-01-21
6500971 Ester compounds having alicyclic and oxirane structures and method for preparing the same Takeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-12-31
6500961 Lactone compounds having alicyclic structure and their manufacturing method Takeshi Kinsho, Takeru Watanabe, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-12-31
6492090 Polymers, resist compositions and patterning process Tsunehiro Nishi, Seiichiro Tachibana, Mutsuo Nakashima, Takeshi Kinsho, Takeru Watanabe +1 more 2002-12-10
6492089 Polymer, resist composition and patterning process Jun Hatakeyama, Takeshi Kinsho, Mutsuo Nakashima 2002-12-10
6480145 GPS receiver and GPS position measurement method 2002-11-12
6470726 Method for manufacturing an extruded article changing in cross-section and an apparatus for extruding said extruded article Makoto Murata, Masatoshi Enomoto 2002-10-29
6472543 Lactone compounds having alicyclic structure and their manufacturing method Takeshi Kinsho, Takeru Watanabe, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-10-29
6469220 Tertiary alcohol compounds having an alicyclic structure Takeshi Kinsho, Takeru Watanabe 2002-10-22
6466163 GPS receiver and portable communication apparatus Tetsuya Naruse, Katsuya Hori, Koichiro Teranishi 2002-10-15
6448420 Acid-decomposable ester compound suitable for use in resist material Takeshi Kinsho, Tsunehiro Nishi, Takeru Watanabe, Mutsuo Nakashima, Jun Hatakeyama 2002-09-10
6444396 Ester compounds, polymers, resist composition and patterning process Takeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Jun Hatakeyama 2002-09-03
6445341 GPS receiver and GPS reception method 2002-09-03
6413695 Resist compositions and patterning process Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Jun Hatakeyama 2002-07-02
6403822 Ester compounds having alicyclic structure and method for preparing same Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana, Tsunehiro Nishi +1 more 2002-06-11
6403823 Ester compounds having alicyclic structure and method for preparing same Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana, Tsunehiro Nishi +1 more 2002-06-11
6399274 Resist composition and patterning process Takeshi Kinsho, Tsunehiro Nishi, Takeru Watanabe, Jun Hatakeyama 2002-06-04
6337415 Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane Ayumu Kiyomori, Tohru Kubota, Takeshi Kinsho, Takeru Watanabe 2002-01-08
6312867 Ester compounds, polymers, resist compositions and patterning process Takeshi Kinsho, Tsunehiro Nishi, Hideshi Kurihara, Takeru Watanabe, Osamu Watanabe +3 more 2001-11-06
6291696 Preparation of tris (trimethylsilyl) silylethyl esters Takeshi Kinsho, Takeru Watanabe, Tohru Kubota, Ayumu Kiyomori 2001-09-18
6284429 Ester compounds, polymers, resist compositions and patterning process Takeshi Kinsho, Tsunehiro Nishi, Hideshi Kurihara, Mutsuo Nakashima, Takeru Watanabe 2001-09-04
6280898 Lactone-containing compounds, polymers, resist compositions, and patterning method Tsunehiro Nishi, Takeshi Kinsho, Jun Hatakeyama, Osamu Watanabe 2001-08-28
6147249 Ester compounds, polymers, resist composition and patterning process Takeru Watanabe, Takeshi Kinsho, Tsunehiro Nishi, Mutsuo Nakashima, Jun Hatakeyama 2000-11-14
6138695 Substrate processing apparatus Takuya Shibao, Toshiyuki Osaki 2000-10-31
5871169 Photographic film with retainer portion cut along perforation edge 1999-02-16