Issued Patents All Time
Showing 26–50 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7862662 | Method and material for cleaning a substrate | Erik M. Freer, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2011-01-04 |
| 7806126 | Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same | Katrina Mikhaylichenko, Kenneth C. Dodge, Mikhail Korolik, Michael Ravkin, Fritz Redeker | 2010-10-05 |
| 7799141 | Method and system for using a two-phases substrate cleaning compound | Mikhail Korolik, Erik M. Freer, Katrina Mikhaylichenko, Mike Ravkin, Fritz Redeker | 2010-09-21 |
| 7749689 | Methods for providing a confined liquid for immersion lithography | David Hemker, Fred C. Redeker, John M. Boyd, Michael Ravkin, Mikhail Korolik | 2010-07-06 |
| 7737097 | Method for removing contamination from a substrate and for making a cleaning solution | Erik M. Freer, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2010-06-15 |
| 7722724 | Methods for substrate processing in cluster tool configurations having meniscus application systems | Carl Woods | 2010-05-25 |
| 7703462 | Reduction of entrance and exit marks left by a substrate-processing meniscus | Robert O'Donnell, Mike Ravkin | 2010-04-27 |
| 7696141 | Cleaning compound and method and system for using the cleaning compound | Erik M. Freer, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2010-04-13 |
| 7648584 | Method and apparatus for removing contamination from substrate | Erik M. Freer, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fred C. Redeker +2 more | 2010-01-19 |
| 7625452 | Apparatuses and methods for cleaning a substrate | Aleksander Owczarz, Alan M. Schoepp, Fritz Redeker | 2009-12-01 |
| 7614411 | Controls of ambient environment during wafer drying using proximity head | Mikhail Korolik, Mike Ravkin, Jeffrey Farber | 2009-11-10 |
| 7598175 | Apparatus and method for confined area planarization | John M. Boyd, Fritz Redeker, Yezdi Dordi, Michael Ravkin | 2009-10-06 |
| 7597765 | Post etch wafer surface cleaning with liquid meniscus | Ji Zhu, Seokmin Yun, Mark Wilcoxson | 2009-10-06 |
| 7591613 | Method and apparatus for transporting a substrate using non-newtonian fluid | Mike Ravkin, John Parks, Mikhail Korolik, Fred C. Redeker | 2009-09-22 |
| 7584761 | Wafer edge surface treatment with liquid meniscus | Seokmin Yun, John M. Boyd, Fritz Redeker | 2009-09-08 |
| 7568490 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | Mike Ravkin, Jeffrey Farber, Mikhail Korolik, Fritz Redeker, Aleksander Owczarz | 2009-08-04 |
| 7534307 | Methods for processing wafer surfaces using thin, high velocity fluid layer | Michael Ravkin, Michael G. R. Smith, Fritz Redeker, Mikhail Korolik, Christian DiPietro | 2009-05-19 |
| 7464719 | Multi-menisci processing apparatus | James P. Garcia, Mike Ravkin, Carl Woods, Fred C. Redeker | 2008-12-16 |
| 7441299 | Apparatuses and methods for cleaning a substrate | Aleksander Owczarz, Alan M. Schoepp, Fritz Redeker | 2008-10-28 |
| 7416370 | Method and apparatus for transporting a substrate using non-Newtonian fluid | Mike Ravkin, John Parks, Mikhail Korolik, Fred C. Redeker | 2008-08-26 |
| 7395611 | System processing a substrate using dynamic liquid meniscus | James P. Garcia, Michael Ravkin, Fred C. Redeker, Carl Woods | 2008-07-08 |
| 7396430 | Apparatus and method for confined area planarization | John M. Boyd, Fritz Redeker, Yezdi Dordi, Michael Ravkin | 2008-07-08 |
| 7389783 | Proximity meniscus manifold | Carl Woods, Michael G. R. Smith, John Parks, James P. Garcia | 2008-06-24 |
| 7387689 | Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces | Mike Ravkin, Carl Woods, Fritz Redeker, James P. Garcia | 2008-06-17 |
| 7383843 | Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer | Michael Ravkin, Michael G. R. Smith, Fritz Redeker, Mikhail Korolik, Christian DiPietro | 2008-06-10 |