Issued Patents All Time
Showing 51–71 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6071810 | Method of filling contact holes and wiring grooves of a semiconductor device | Junichi Wada, Atsuko Sakata, Tomio Katata, Takamasa Usui, Masahiko Hasunuma +3 more | 2000-06-06 |
| 5851842 | Measurement system and measurement method | Ryota Katsumata, Naoki Yasuda, Hideshi Miyajima, Iwao Higashikawa, Masaki Hotta | 1998-12-22 |
| 5775980 | Polishing method and polishing apparatus | Yasutaka Sasaki, Mie Matsuo, Rempei Nakata, Junichi Wada, Hiroyuki Yano +1 more | 1998-07-07 |
| 5770095 | Polishing agent and polishing method using the same | Yasutaka Sasaki, Hisashi Kaneko, Hideaki Hirabayashi, Masatoshi Higuchi | 1998-06-23 |
| 5731634 | Semiconductor device having a metal film formed in a groove in an insulating film | Mie Matsuo, Haruo Okano, Kyoichi Suguro, Hideshi Miyajima, Jun Wada | 1998-03-24 |
| 5664989 | Polishing pad, polishing apparatus and polishing method | Rempei Nakata, Hisashi Kaneko, Takeshi Nishioka, Yoshikuni Tateyama, Yutaka Nakano +1 more | 1997-09-09 |
| 5661345 | Semiconductor device having a single-crystal metal wiring | Junichi Wada, Hisashi Kaneko, Kyoichi Suguro, Haruo Okano | 1997-08-26 |
| 5641581 | Semiconductor device | Yukio Nishiyama, Rempei Nakata, Haruo Okano, Riichirou Aoki, Takahito Nagamatsu +3 more | 1997-06-24 |
| 5629236 | Method of manufacture of semiconductor device | Jun Wada, Hisashi Kaneko | 1997-05-13 |
| 5607718 | Polishing method and polishing apparatus | Yasutaka Sasaki, Mie Matsuo, Rempei Nakata, Junichi Wada, Hiroyuki Yano +1 more | 1997-03-04 |
| 5561082 | Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide | Mie Matsuo, Haruo Okano, Kyoichi Suguro, Hideshi Miyajima, Jun Wada | 1996-10-01 |
| 5514425 | Method of forming a thin film | Hitoshi Ito, Kyoichi Suguro, Haruo Okano, Shinji Himori, Kazuya Nagaseki +1 more | 1996-05-07 |
| 5466942 | Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus | Itsuko Sakai, Haruo Okano | 1995-11-14 |
| 5429995 | Method of manufacturing silicon oxide film containing fluorine | Yukio Nishiyama, Rempei Nakata, Haruo Okano, Riichirou Aoki, Takahito Nagamatsu +3 more | 1995-07-04 |
| 5424246 | Method of manufacturing semiconductor metal wiring layer by reduction of metal oxide | Mie Matsuo, Haruo Okano, Kyoichi Suguro, Hideshi Miyajima, Jun Wada | 1995-06-13 |
| 5409862 | Method for making aluminum single crystal interconnections on insulators | Junichi Wada, Hisashi Kaneko, Kyoichi Suguro, Haruo Okano | 1995-04-25 |
| 5312519 | Method of cleaning a charged beam apparatus | Itsuko Sakai, Haruo Okano | 1994-05-17 |
| 5298112 | Method for removing composite attached to material by dry etching | Tsunetoshi Arikado, Haruo Okano, Keiji Horioka | 1994-03-29 |
| 5290733 | Method of manufacturing semiconductor devices including depositing aluminum on aluminum leads | Ayako Shimazaki, Haruo Okano | 1994-03-01 |
| 5030319 | Method of oxide etching with condensed plasma reaction product | Hirotaka Nishino, Haruo Okano | 1991-07-09 |
| 4698238 | Pattern-forming method | Haruo Okano, Yasuhiro Horiike | 1987-10-06 |