Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12165905 | Process kit enclosure system | Helder Lee, Nicholas Michael Kopec, Leon Volfovski, Douglas R. McAllister, Andreas Schmid +2 more | 2024-12-10 |
| 12094752 | Wafer edge ring lifting solution | Michael R. Rice, Sunil Srinivasan, Rajinder Dhindsa, Steven E. Babayan, Olivier Luere +2 more | 2024-09-17 |
| 12002703 | Lift pin assembly | Anand KUMAR | 2024-06-04 |
| 11887879 | In-situ apparatus for semiconductor process module | Steven E. Babayan, Stephen Prouty, Andreas Schmid | 2024-01-30 |
| 11728143 | Process kit with adjustable tuning ring for edge uniformity control | — | 2023-08-15 |
| 11569114 | Semiconductor processing with cooled electrostatic chuck | Steven E. Babayan, Andreas Schmid, Stephen Prouty, Andrew Antoine NOUJAIM | 2023-01-31 |
| 11437261 | Cryogenic electrostatic chuck | Steven E. Babayan, Stephen Prouty, Alvaro Garcia de Gorordo, Andreas Schmid, Andrew Antoine NOUJAIM | 2022-09-06 |
| 11393710 | Wafer edge ring lifting solution | Michael R. Rice, Sunil Srinivasan, Rajinder Dhindsa, Steven E. Babayan, Olivier Luere +2 more | 2022-07-19 |
| 11373893 | Cryogenic electrostatic chuck | Steven E. Babayan, Stephen Prouty, Alvaro Garcia de Gorordo, Andreas Schmid, Andrew Antoine NOUJAIM | 2022-06-28 |
| 11201037 | Process kit with adjustable tuning ring for edge uniformity control | — | 2021-12-14 |
| 11075105 | In-situ apparatus for semiconductor process module | Steven E. Babayan, Stephen Prouty, Andreas Schmid | 2021-07-27 |
| 11004722 | Lift pin assembly | Anand KUMAR | 2021-05-11 |
| 10847351 | Plasma chamber with tandem processing regions | Andrew Nguyen, Xue Yang Chang | 2020-11-24 |
| 10790123 | Process kit with adjustable tuning ring for edge uniformity control | — | 2020-09-29 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom Choi +3 more | 2020-09-08 |
| 10727096 | Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance | Andrew Nguyen, Tom K. Cho | 2020-07-28 |
| 10600623 | Process kit with adjustable tuning ring for edge uniformity control | — | 2020-03-24 |
| 10446418 | Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance | Andrew Nguyen, Tom K. Cho | 2019-10-15 |
| 10381200 | Plasma chamber with tandem processing regions | Andrew Nguyen, Xue Yang Chang | 2019-08-13 |
| 10211033 | Inline DPS chamber hardware are design to enable axis symmetry for improved flow conductance and uniformity | Andrew Nguyen, Tom K. Cho | 2019-02-19 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom K. Cho +3 more | 2017-09-12 |