Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8725597 | Merchant scoring system and transactional database | Michael Jon Mauseth, Woodrow Arnold Jones, Jr., Joel R. Springer | 2014-05-13 |
| 7928571 | Device having dual etch stop liner and reformed silicide layer and related methods | Dureseti Chidambarrao, Ying Li, Shreesh Narasimha | 2011-04-19 |
| 7776695 | Semiconductor device structure having low and high performance devices of same conductive type on same substrate | John C. Arnold, Dureseti Chidambarrao, Ying Li, Shreesh Narasimha, Siddhartha Panda +2 more | 2010-08-17 |
| 7732270 | Device having enhanced stress state and related methods | Dureseti Chidambarrao, Ying Li, Shreesh Narasimha, Haining Yang, Huilong Zhu | 2010-06-08 |
| 7683434 | Preventing cavitation in high aspect ratio dielectric regions of semiconductor device | Paul D. Agnello, K. Paul Muller | 2010-03-23 |
| 7627836 | OPC trimming for performance | James A. Culp, Lars Liebmann, K. Paul Muller, Shreesh Narasimha, Stephen L. Runyon +1 more | 2009-12-01 |
| 7459384 | Preventing cavitation in high aspect ratio dielectric regions of semiconductor device | Paul D. Agnello, K. Paul Muller | 2008-12-02 |
| 7446062 | Device having dual etch stop liner and reformed silicide layer and related methods | Dureseti Chidambarrao, Ying Li, Shreesh Narasimha | 2008-11-04 |
| 7446395 | Device having dual etch stop liner and protective layer | Dureseti Chidambarrao, Ying Li, Shreesh Narasimha | 2008-11-04 |
| 7348635 | Device having enhanced stress state and related methods | Dureseti Chidambarrao, Ying Li, Shreesh Narasimha, Haining Yang, Huilong Zhu | 2008-03-25 |
| 7306983 | Method for forming dual etch stop liner and protective layer in a semiconductor device | Dureseti Chidambarrao, Ying Li, Shreesh Narasimha | 2007-12-11 |
| 7030012 | Method for manufacturing tungsten/polysilicon word line structure in vertical DRAM | Ramachandra Divakaruni, Oleg Gluschenkov, Oh-Jung Kwon | 2006-04-18 |
| 7018779 | Apparatus and method to improve resist line roughness in semiconductor wafer processing | Wai-Kin Li, Joseph J. Mezzapelle | 2006-03-28 |
| 6908806 | Gate metal recess for oxidation protection and parasitic capacitance reduction | Haining Yang, Ramachandra Divakaruni, Oleg Gluschenkov, Hongwen Yan, Ravikumar Ramachandran | 2005-06-21 |
| 6897107 | Method for forming TTO nitride liner for improved collar protection and TTO reliability | Rama Divakaruni, Thomas W. Dyer, Jack A. Mandelman, Venkatachajam C. Jaiprakash | 2005-05-24 |
| 6809368 | TTO nitride liner for improved collar protection and TTO reliability | Rama Divakaruni, Thomas W. Dyer, Jack A. Mandelman, Venkatachalam C. Jaiprakash | 2004-10-26 |
| 6794242 | Extendible process for improved top oxide layer for DRAM array and the gate interconnects while providing self-aligned gate contacts | Thomas W. Dyer, Andreas Knorr, Laertis Economikos, Scott D. Halle, Norbert Arnod | 2004-09-21 |
| 6794282 | Three layer aluminum deposition process for high aspect ratio CL contacts | Thomas Goebel, Werner Robl, Mihel Seitz | 2004-09-21 |
| 6790739 | Structure and methods for process integration in vertical DRAM cell fabrication | Larry Nesbit, Jochen Beintner, Rama Divakaruni | 2004-09-14 |
| 6724054 | Self-aligned contact formation using double SiN spacers | Woo-Tag Kang, Mihel Seitz | 2004-04-20 |
| 6635526 | Structure and method for dual work function logic devices in vertical DRAM process | Rama Divakaruni, Rajesh Rengarajan | 2003-10-21 |
| 6620676 | Structure and methods for process integration in vertical DRAM cell fabrication | Larry Nesbit, Jochen Beintner, Rama Divakaruni | 2003-09-16 |
| 6541810 | Modified vertical MOSFET and methods of formation thereof | Ramachandra Divakaruni, Prakash Dev, Larry Nesbit | 2003-04-01 |
| 6509226 | Process for protecting array top oxide | Venkatachalam C. Jaiprakash, Jack A. Mandelman, Ramachandra Divakaruni, Mihel Seitz | 2003-01-21 |
| 6358867 | Orientation independent oxidation of silicon | Helmut Tews, Jonathan E. Faltermeir, Carol J. Heenan, Oleg Gluschenkov | 2002-03-19 |