Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9873946 | Multi-station sequential curing of dielectric films | Jason Dirk Haverkamp, Dennis M. Hausmann, Kevin McLaughlin, Michael Rivkin, Eugene Smargiassi +1 more | 2018-01-23 |
| 9835388 | Systems for uniform heat transfer including adaptive portions | Keerthi GOWDARU | 2017-12-05 |
| 8980769 | Multi-station sequential curing of dielectric films | Jason Dirk Haverkamp, Dennis M. Hausmann, Kevin McLaughlin, Michael Rivkin, Eugene Smargiassi +1 more | 2015-03-17 |
| 8951348 | Single-chamber sequential curing of semiconductor wafers | Feng Wang, George D. Kamian, Steve Gentile, Mark Yam | 2015-02-10 |
| 8889233 | Method for reducing stress in porous dielectric films | Maxim Kelman, Feng Wang, Victor Lu, Sean Chang, Guangquan Lu | 2014-11-18 |
| 8629068 | Multi-station sequential curing of dielectric films | Michael Rivkin, Eugene Smargiassi, Mohamed Sabri | 2014-01-14 |
| 8454750 | Multi-station sequential curing of dielectric films | Michael Rivkin, Eugene Smargiassi, Mohamed Sabri | 2013-06-04 |
| 7941039 | Pedestal heat transfer and temperature control | Stephen V. Gentile, Peter J. Woytowitz, Sassan Roham, George D. Kamian, Michael Rivkin | 2011-05-10 |
| 7503334 | Apparatus and methods for processing semiconductor substrates using supercritical fluids | Souvik Banerjee, Francisco Juarez, Karen A. Reinhardt, Sanjay Gopinath | 2009-03-17 |
| 7327948 | Cast pedestal with heating element and coaxial heat exchanger | Stephen V. Gentile, Peter J. Woytowitz, Sassan Roham, George D. Kamian | 2008-02-05 |
| 7105061 | Method and apparatus for sealing substrate load port in a high pressure reactor | Arkadiy Shimanovich, Vladimir Starov | 2006-09-12 |
| 6905556 | Method and apparatus for using surfactants in supercritical fluid processing of wafers | Raashina Humayun, Patrick Joyce, Adrianne K. Tipton, Dennis W. Hess, Satyanarayana Myneni +1 more | 2005-06-14 |
| 6848455 | Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species | Adrianne K. Tipton | 2005-02-01 |
| 6848458 | Apparatus and methods for processing semiconductor substrates using supercritical fluids | Souvik Banerjee, Francisco Juarez, Karen A. Reinhardt, Sanjay Gopinath | 2005-02-01 |
| 6800142 | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment | Adrianne K. Tipton, Souvik Banerjee, Raashina Humayun, Patrick Joyce | 2004-10-05 |
| 6764552 | Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials | Patrick Joyce, Adrianne K. Tipton, Dennis W. Hess, Satyanarayana Myneni, Galit Levitin | 2004-07-20 |
| 6563092 | Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry | Arkadiy Shimanovich, Prasad N. Gadgil | 2003-05-13 |
| 6550484 | Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing | Sanjay Gopinath, Patrick A. Van Cleemput, Francisco Juarez | 2003-04-22 |
| 6333268 | Method and apparatus for removing post-etch residues and other adherent matrices | Vladimir Starov, Shmuel Erez, Syed S. Basha, Arkadiy Shimanovich, Ravi Vellanki +2 more | 2001-12-25 |
| 6228563 | Method and apparatus for removing post-etch residues and other adherent matrices | Vladimir Starov, Syed S. Basha, Karen A. Reinhardt, Aleksandr Kabansky | 2001-05-08 |