Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7105061 | Method and apparatus for sealing substrate load port in a high pressure reactor | Krishnan Shrinivasan, Arkadiy Shimanovich | 2006-09-12 |
| 6333268 | Method and apparatus for removing post-etch residues and other adherent matrices | Shmuel Erez, Syed S. Basha, Arkadiy Shimanovich, Ravi Vellanki, Krishnan Shrinivasan +2 more | 2001-12-25 |
| 6228563 | Method and apparatus for removing post-etch residues and other adherent matrices | Syed S. Basha, Krishnan Shrinivasan, Karen A. Reinhardt, Aleksandr Kabansky | 2001-05-08 |
| 5201960 | Method for removing photoresist and other adherent materials from substrates | — | 1993-04-13 |
| H102 | Controlling resolution of exposed resist in device lithography | Michael Rubinstein | 1986-08-05 |