Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11932939 | Lids and lid assembly kits for atomic layer deposition chambers | Muhammad M. Rasheed, Srinivas Gandikota, Mario D. Sanchez, Yixiong Yang, Deepak Jadhav +1 more | 2024-03-19 |
| 11384432 | Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate | Muhammad M. Rasheed, Srinivas Gandikota, Mario D. Sanchez, Yixiong Yang, Deepak Jadhav +1 more | 2022-07-12 |
| 11355391 | Method for forming a metal gapfill | Xi Cen, Feiyue Ma, Kai Wu, Yu Lei, Kazuya Daito +13 more | 2022-06-07 |
| 11018009 | Tuning work function of p-metal work function films through vapor deposition | Wei V. Tang, Chi-Chou Lin, Paul F. Ma, Yixiong Yang, Mei Chang +1 more | 2021-05-25 |
| 10879081 | Methods of reducing or eliminating defects in tungsten film | Wei V. Tang, Chi-Chou Lin, Paul F. Ma, Kai Wu, Vikash Banthia +4 more | 2020-12-29 |
| 10755947 | Methods of increasing selectivity for selective etch processes | Wenyu Zhang, Yixiong Yang, Mario D. Sanchez, Wei V. Tang, Paul F. Ma | 2020-08-25 |
| 10643840 | Selective deposition defects removal by chemical etch | Jeffrey W. Anthis, Chang Ke, Pratham Jain, Benjamin Schmiege, Michael S. Jackson +3 more | 2020-05-05 |
| 10199230 | Methods for selective deposition of metal silicides via atomic layer deposition cycles | Seshadri Ganguli, Yixiong Yang, Bhushan Zope, Xinyu Fu, Avgerinos V. Gelatos +1 more | 2019-02-05 |
| 9947578 | Methods for forming low-resistance contacts through integrated process flow systems | Yu Lei, Vikash Banthia, Kai Wu, Xinyu Fu, Yi Xu +9 more | 2018-04-17 |
| 9595466 | Methods for etching via atomic layer deposition (ALD) cycles | Xinyu Fu, Srinivas Gandikota, Mei Chang, Seshadri Ganguli, Yixiong Yang +2 more | 2017-03-14 |