Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11566887 | Differential height measurement using interstitial mirror plate | Guido Deboer | 2023-01-31 |
| 11419202 | Laser produced plasma light source having a target material coated on a cylindrically-symmetric element | Alexey Kuritsyn, Brian Ahr, Rudy F. Garcia, Oleg Khodykin | 2022-08-16 |
| 10893599 | Laser produced plasma light source having a target material coated on a cylindrically-symmetric element | Alexey Kuritsyn, Brian Ahr, Rudy F. Garcia, Oleg Khodykin | 2021-01-12 |
| 10777377 | Multi-column spacing for photomask and reticle inspection and wafer print check verification | Robert Haynes, Moshe E. Preil | 2020-09-15 |
| 10438769 | Array-based characterization tool | Alex Lipkind, Alon Rosenthal, John Gerling, Lawrence P. Muray, Robert Haynes | 2019-10-08 |
| 10021773 | Laser produced plasma light source having a target material coated on a cylindrically-symmetric element | Alexey Kuritsyn, Brian Ahr, Rudy F. Garcia, Oleg Khodykin | 2018-07-10 |
| 9810991 | System and method for cleaning EUV optical elements | Gildardo Delgado, Rudy F. Garcia | 2017-11-07 |
| 9759912 | Particle and chemical control using tunnel flow | Gildardo Delgado, Daniel Wack, John R. Torczynski, Leonard E. Klebanoff | 2017-09-12 |
| 9544984 | System and method for generation of extreme ultraviolet light | Alexander N. Bykanov, Oleg Khodykin, Daniel Wack, Konstantin Tsigutkin, Layton Hale +3 more | 2017-01-10 |
| 9448343 | Segmented mirror apparatus for imaging and method of using the same | Damon F. Kvamme | 2016-09-20 |
| 9348214 | Spectral purity filter and light monitor for an EUV reticle inspection system | Daimian Wang, Li-Ping Wang, David Alles | 2016-05-24 |
| 9244368 | Particle control near reticle and optics using showerhead | Gildardo Delgado, Rudy F. Garcia, John R. Torczynski, Anthony S. Geller, Daniel J. Rader +2 more | 2016-01-26 |
| 9164388 | Temperature control in EUV reticle inspection tool | Daniel Wack, Douglas Fowler | 2015-10-20 |
| 8917432 | Multiplexing EUV sources in reticle inspection | Daniel Wack, Daimian Wang, Karl R. Umstadter, Ed Ma | 2014-12-23 |
| 8414688 | Recirculation high purity system for protecting optical modules or inspection system during storage, transport and shipping | Gildardo Delgado, Rudolf Brunner | 2013-04-09 |
| 7050170 | Apparatus and method for maintaining uniform and stable temperature for cavity enhanced optical spectroscopy | Bernard Fidric | 2006-05-23 |