Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7745328 | Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) | Kang Sub Yim, Melissa M. Tam, Chi-I Lang, Peter Wai-Man Lee, Li-Qun Xia | 2010-06-29 |
| 7465659 | Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) | Kang Sub Yim, Melissa M. Tam, Chi-I Lang, Peter Wai-Man Lee, Li-Qun Xia | 2008-12-16 |
| 7459404 | Adhesion improvement for low k dielectrics | Lihua Li, Tzu-Fang Huang, Li-Qun Xia, Peter Wai-Man Lee, Hichem M'Saad +2 more | 2008-12-02 |
| 7157384 | Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) | Kang Sub Yim, Melissa M. Tam, Chi-I Lang, Peter Wai-Man Lee, Li-Qun Xia | 2007-01-02 |
| 7153787 | CVD plasma assisted lower dielectric constant SICOH film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Chen-An Chen, Li-Qun Xia +2 more | 2006-12-26 |
| 7117064 | Method of depositing dielectric films | Srinivas D. Nemani, Li-Qun Xia, Ellie Yieh, Ping Xu, Francimar Campana-Schmitt +1 more | 2006-10-03 |
| 7030041 | Adhesion improvement for low k dielectrics | Lihua Li, Tzu-Fang Huang, Li-Qun Xia, Peter Wai-Man Lee, Hichem M'Saad +2 more | 2006-04-18 |
| 7008484 | Method and apparatus for deposition of low dielectric constant materials | Kang Sub Yim, Soovo Sen, Peter Wai-Man Lee, Ellie Yieh | 2006-03-07 |
| 7001850 | Method of depositing dielectric films | Srinivas D. Nemani, Li-Qun Xia, Ellie Yieh, Ping Xu, Francimar Campana-Schmitt +1 more | 2006-02-21 |
| 6943127 | CVD plasma assisted lower dielectric constant SICOH film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Chen-An Chen, Li-Qun Xia +2 more | 2005-09-13 |
| 6911403 | Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics | Lihua Li, Tsutomu Tanaka, Tzu-Fang Huang, Li-Qun Xia, Visweswaren Sivaramakrishnan +2 more | 2005-06-28 |
| 6838393 | Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide | Kang Sub Yim, Melissa M. Tam, Chi-I Lang, Peter Wai-Man Lee, Li-Qun Xia | 2005-01-04 |
| 6825562 | Damascene structure fabricated using a layer of silicon-based photoresist material | Mehul Naik, Tim Weidman, Allen Zhao | 2004-11-30 |
| 6764958 | Method of depositing dielectric films | Srinivas D. Nemani, Li-Qun Xia, Ellie Yieh, Ping Xu, Francimar Campana-Schmitt +1 more | 2004-07-20 |
| 6632735 | Method of depositing low dielectric constant carbon doped silicon oxide | Wai-Fan Yau, Ju-Hyung Lee, Nasreen Chopra, Tzu-Fang Huang, David Cheung +5 more | 2003-10-14 |
| 6589715 | Process for depositing and developing a plasma polymerized organosilicon photoresist film | Olivier Joubert, Cedric Monget, Timothy Weidman, David Mui | 2003-07-08 |
| 6514857 | Damascene structure fabricated using a layer of silicon-based photoresist material | Mehul Naik, Tim Weidman, Allen Zhao | 2003-02-04 |
| 6486082 | CVD plasma assisted lower dielectric constant sicoh film | Seon-Mee Cho, Peter Wai-Man Lee, Chi-I Lang, Chen-An Chen, Li-Qun Xia +2 more | 2002-11-26 |
| 6395092 | Apparatus for depositing high deposition rate halogen-doped silicon oxide layer | Judy H. Huang, David Cheung | 2002-05-28 |
| 6258735 | Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber | Li-Qun Xia, Tian-Hoe Lim, Huong Nguyen | 2001-07-10 |
| 6238844 | Process for depositing a plasma polymerized organosilicon photoresist film | Olivier Joubert, Cedric Monget, Timothy Weidman, David Mui | 2001-05-29 |
| 6204168 | Damascene structure fabricated using a layer of silicon-based photoresist material | Mehul Naik, Tim Weidman, Allen Zhao | 2001-03-20 |
| 6090530 | Method and apparatus for depositing deep UV photoresist films | Timothy Weidman | 2000-07-18 |
| 6077764 | Process for depositing high deposition rate halogen-doped silicon oxide layer | Judy H. Huang, David Cheung | 2000-06-20 |
| 5885751 | Method and apparatus for depositing deep UV photoresist films | Timothy Weidman | 1999-03-23 |