Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8900961 | Selective deposition of germanium spacers on nitride | Anthony I. Chou, Toshiharu Furukawa, Steven J. Holmes, Wesley C. Natzle | 2014-12-02 |
| 8685845 | Epitaxial growth of silicon doped with carbon and phosphorus using hydrogen carrier gas | Abhishek Dube, Jinghong Li, Rainer Loesing, Dominic J. Schepis | 2014-04-01 |
| 8575655 | Method and structure for PMOS devices with high K metal gate integration and SiGe channel engineering | Stephen W. Bedell, Michael P. Chudzik, Judson R. Holt, Dominic J. Schepis | 2013-11-05 |
| 8563446 | Technique to create a buried plate in embedded dynamic random access memory device | Jacob B. Dadson, Paul Higgins, Babar A. Khan, John J. Moore, Christopher C. Parks +1 more | 2013-10-22 |
| 8440547 | Method and structure for PMOS devices with high K metal gate integration and SiGe channel engineering | Stephen W. Bedell, Michael P. Chudzik, Judson R. Holt, Dominic J. Schepis | 2013-05-14 |
| 8389352 | Silicon germanium film formation method and structure | Abhishek Dube, Dominic J. Schepis | 2013-03-05 |
| 8236710 | Technique to create a buried plate in embedded dynamic random access memory device | Jacob B. Dadson, Paul Higgins, Babar A. Khan, John J. Moore, Christopher C. Parks +1 more | 2012-08-07 |
| 8173524 | Process for epitaxially growing epitaxial material regions | Anthony I. Chou, Abhishek Dube, Dominic J. Schepis | 2012-05-08 |
| 8105955 | Integrated circuit system with carbon and non-carbon silicon | Jin Ping Liu, Richard J. Murphy, Anita Madan | 2012-01-31 |
| 8080451 | Fabricating semiconductor structures | Thomas N. Adam, Eric C. Harley, Judson R. Holt | 2011-12-20 |
| 7888241 | Selective deposition of germanium spacers on nitride | Anthony I. Chou, Toshiharu Furukawa, Steven J. Holmes, Wesley C. Nazle | 2011-02-15 |
| 7838932 | Raised STI structure and superdamascene technique for NMOSFET performance enhancement with embedded silicon carbon | Dureseti Chidambarrao, Judson R. Holt, Yaocheng Liu, Kern Rim | 2010-11-23 |
| 7776624 | Method for improving semiconductor surfaces | Judson R. Holt, Jeremy J. Kempisty, Suk Hoon Ku, Woo-Hyeong Lee, Amlan Majumdar +4 more | 2010-08-17 |
| 7767579 | Protection of SiGe during etch and clean operations | Zhijiong Luo, Renee T. Mo, Shreesh Narasimha, Katsunori Onishi | 2010-08-03 |
| 7759213 | Pattern independent Si:C selective epitaxy | Abhishek Dube, Dominic J. Schepis | 2010-07-20 |
| 7705385 | Selective deposition of germanium spacers on nitride | Anthony I. Chou, Toshiharu Furukawa, Steven J. Holmes, Wesley C. Natzle | 2010-04-27 |
| 7687804 | Method for fabricating a semiconductor structures and structures thereof | Thomas N. Adam, Eric C. Harley, Judson R. Holt | 2010-03-30 |
| 7595010 | Method for producing a doped nitride film, doped oxide film and other doped films | Judson R. Holt, Kevin K. Chan, Sadanand V. Deshpande, Rangarajan Jagannathan | 2009-09-29 |
| 7473594 | Raised STI structure and superdamascene technique for NMOSFET performance enhancement with embedded silicon carbon | Dureseti Chidambarrao, Judson R. Holt, Yaocheng Liu, Kern Rim | 2009-01-06 |
| 7361611 | Doped nitride film, doped oxide film and other doped films | Judson R. Holt, Kevin K. Chan, Sadanand V. Deshpande, Rangarajan Jagannathan | 2008-04-22 |
| 7232774 | Polycrystalline silicon layer with nano-grain structure and method of manufacture | Bruce B. Doris, Romany Ghali, Oleg Gluschenkov, Michael A. Gribelyuk, Woo-Hyeong Lee +1 more | 2007-06-19 |
| 7119016 | Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion | Anita Madan, Woo-Hyeong Lee, Gregory DiBello, Ramaseshan Iyer | 2006-10-10 |
| 7001844 | Material for contact etch layer to enhance device performance | Shreesh Narasimha, Victor Chan, Judson R. Holt, Satya N. Chakravarti | 2006-02-21 |
| 6838695 | CMOS device structure with improved PFET gate electrode | Bruce B. Doris, Kevin K. Chan, Daniel A. Uriarte | 2005-01-04 |
| 6576565 | RTCVD process and reactor for improved conformality and step-coverage | Oleg Gluschenkov, Irene McStay | 2003-06-10 |