Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10566446 | Mitigation of hot carrier damage in field-effect transistors | Yun-Yu Wang, Jochonia N. Nxumalo, Dimitrios Ioannou, Kenneth Bandy, Jeffrey J. Brown +1 more | 2020-02-18 |
| 8030157 | Liner protection in deep trench etching | Habib Hichri, Kaushik A. Kumar, Narender Rana, Richard S. Wise, Hakeem B. S. Akinmade-Yusuff | 2011-10-04 |
| 7856341 | Heat sink | Brian L. Carlson, Bruce J. Chamberlin, Mark K. Hoffmeyer, Matthew S. Kelly, Gregory S. Killinger +3 more | 2010-12-21 |
| 6440635 | Low “K” factor hybrid photoresist | Steven J. Holmes, Niranjan M. Patel, Paul A. Rabidoux | 2002-08-27 |
| 6372406 | Deactivated aromatic amines as additives in acid-catalyzed resists | William R. Brunsvold, Pushkara R. Varanasi | 2002-04-16 |
| 6372412 | Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby | Mark C. Hakey, Steven J. Holmes, David V. Horak, Niranjan M. Patel, Paul A. Rabidoux | 2002-04-16 |
| 6365321 | Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations | Kuang-Jung Chen, Ronald A. DellaGuardia, Hiroshi Ito, George M. Jordhamo | 2002-04-02 |
| 6344305 | Radiation sensitive silicon-containing resists | Qinghuang Lin, Douglas Charles LaTulipe, David E. Seeger, William R. Brunsvold, Ali Afzali-Ardakani | 2002-02-05 |
| 6340734 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Qinghuang Lin, Marie Angelopoulos, Ratnam Sooriyakumaran | 2002-01-22 |
| 6313492 | Integrated circuit chip produced by using frequency doubling hybrid photoresist | Mark C. Hakey, Steven J. Holmes, David V. Horak, Niranjan M. Patel, Paul A. Rabidoux | 2001-11-06 |
| 6303263 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Mahmoud Khojasteh, Qinghuang Lin | 2001-10-16 |
| 6300035 | Chemically amplified positive photoresists | James W. Thackeray, Peter R. Hagerty, James F. Cameron, Wu-Song Huang, Willard E. Conley | 2001-10-09 |
| 6284439 | "Method of producing an integrated circuit chip using low ""k"" factor hybrid photoresist and apparatus formed thereby" | Steven J. Holmes, Niranjan M. Patel, Paul A. Rabidoux | 2001-09-04 |
| 6268436 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Mahmoud Khojasteh, Quighuang Lin | 2001-07-31 |
| 6265134 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Pushkara R. Varanasi, Mahmoud Khojasteh, Ranee W. Kwong | 2001-07-24 |
| 6245492 | Photoresist system and process for aerial image enhancement | Wu-Song Huang, Ranee W. Kwong, Kathleen H. Martinek | 2001-06-12 |
| 6210856 | Resist composition and process of forming a patterned resist layer on a substrate | Qinghuang Lin, Timothy Hughes, George M. Jordhamo, Wayne M. Moreau, Niranjan M. Patel | 2001-04-03 |
| 6200726 | Optimization of space width for hybrid photoresist | Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Paul A. Rabidoux | 2001-03-13 |
| 6190829 | "Low ""K"" factor hybrid photoresist" | Steve Holmes, Niranjan M. Patel, Paul A. Rabidoux | 2001-02-20 |
| 6187505 | Radiation sensitive silicon-containing resists | Qinghuang Lin, Douglas Charles LaTulipe, David E. Seeger, William R. Brunsvold, Ali Afzali-Ardakani | 2001-02-13 |
| 6140015 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Pushkara R. Varanasi, Mahmoud Khojasteh, Ranee W. Kwong | 2000-10-31 |
| 6114082 | Frequency doubling hybrid photoresist having negative and positive tone components and method of preparing the same | Mark C. Hakey, Steven J. Holmes, David V. Horak, Niranjan M. Patel, Paul A. Rabidoux | 2000-09-05 |
| 6103447 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Mahmoud Khojasteh, Qinghuang Lin | 2000-08-15 |
| 6087064 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Qinghuang Lin, Marie Angelopoulos, Ratnam Sooriyakumaran | 2000-07-11 |
| 6043003 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Wu-Song Huang, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo | 2000-03-28 |