Issued Patents All Time
Showing 51–75 of 87 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7872317 | Dual metal gate self-aligned integration | Alessandro C. Callegari, Michael P. Chudzik, Bruce B. Doris, Vijay Narayanan, Michelle L. Steen | 2011-01-18 |
| 7868410 | Gate stack engineering by electrochemical processing utilizing through-gate-dielectric current flow | Philippe M. Vereecken, Veeraraghavan S. Basker, Cyril Cabral, Jr., Emanuel I. Cooper, Hariklia Deligianni +4 more | 2011-01-11 |
| 7863126 | Fabrication of a CMOS structure with a high-k dielectric layer oxidizing an aluminum layer in PFET region | Dae-Gyu Park, Michael P. Chudzik, Vijay Narayanan | 2011-01-04 |
| 7855105 | Planar and non-planar CMOS devices with multiple tuned threshold voltages | Hemanth Jagannathan, Vijay Narayanan | 2010-12-21 |
| 7847356 | Metal gate high-K devices having a layer comprised of amorphous silicon | Tze-Chiang Chen, Bruce B. Doris, Vijay Narayanan | 2010-12-07 |
| 7833849 | Method of fabricating a semiconductor structure including one device region having a metal gate electrode located atop a thinned polygate electrode | Alessandro C. Callegari, Tze-Chiang Chen, Michael P. Chudzik, Bruce B. Doris, Young-Hee Kim +3 more | 2010-11-16 |
| 7821081 | Method and apparatus for flatband voltage tuning of high-k field effect transistors | Supratik Guha, Vijay Narayanan | 2010-10-26 |
| 7820552 | Advanced high-k gate stack patterning and structure containing a patterned high-k gate stack | Siva Kanakasabapathy, Ying Zhang, Edmund M. Sikorski, Hongwen Yan, Vijay Narayanan +1 more | 2010-10-26 |
| 7807525 | Low power circuit structure with metal gate and high-k dielectric | Bruce B. Doris, Eduard A. Cartier, Barry P. Linder, Vijay Narayanan | 2010-10-05 |
| 7790592 | Method to fabricate metal gate high-k devices | Tze-Chiang Chen, Bruce B. Doris, Vijay Narayanan | 2010-09-07 |
| 7785999 | Formation of fully silicided metal gate using dual self-aligned silicide process | Cyril Cabral, Jr., Chester T. Dziobkowski, Sunfei Fang, Evgeni Gousev, Rajarao Jammy +4 more | 2010-08-31 |
| 7776680 | Complementary metal oxide semiconductor device with an electroplated metal replacement gate | Veeraraghavan S. Basker, John M. Cotte, Hariklia Deligianni, Toshiharu Furukawa, William R. Tonti | 2010-08-17 |
| 7776701 | Metal oxynitride as a pFET material | Alessandro C. Callegari, Michael A. Gribelyuk, Vijay Narayanan, Sufi Zafar | 2010-08-17 |
| 7772016 | Method for composition control of a metal compound film | Russell D. Allen, Stephen L. Brown, Alessandro C. Callegari, Michael P. Chudzik, Vijay Narayanan | 2010-08-10 |
| 7750418 | Introduction of metal impurity to change workfunction of conductive electrodes | Michael P. Chudzik, Bruce B. Doris, Supratik Guha, Rajarao Jammy, Vijay Narayanan +2 more | 2010-07-06 |
| 7745278 | Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high K dielectrics | Nestor A. Bojarczuk, Cyril Cabral, Jr., Eduard A. Cartier, Matthew W. Copel, Martin M. Frank +4 more | 2010-06-29 |
| 7723798 | Low power circuit structure with metal gate and high-k dielectric | Bruce B. Doris, Eduard A. Cartier, Barry P. Linder, Vijay Narayanan | 2010-05-25 |
| 7718496 | Techniques for enabling multiple Vt devices using high-K metal gate stacks | Martin M. Frank, Arvind Kumar, Vijay Narayanan, Jeffrey W. Sleight | 2010-05-18 |
| 7709902 | Metal gate CMOS with at least a single gate metal and dual gate dielectrics | Bruce B. Doris, Young-Hee Kim, Barry P. Linder, Vijay Narayanan | 2010-05-04 |
| 7709352 | In-place bonding of microstructures | Guy M. Cohen, Patricia M. Mooney | 2010-05-04 |
| 7696036 | CMOS transistors with differential oxygen content high-k dielectrics | Huiming Bu, Eduard A. Cartier, Bruce B. Doris, Young-Hee Kim, Barry P. Linder +2 more | 2010-04-13 |
| 7666732 | Method of fabricating a metal gate CMOS with at least a single gate metal and dual gate dielectrics | Bruce B. Doris, Young-Hee Kim, Barry P. Linder, Vijay Narayanan | 2010-02-23 |
| 7611979 | Metal gates with low charge trapping and enhanced dielectric reliability characteristics for high-k gate dielectric stacks | Alessandro C. Callegari, Michael P. Chudzik, Barry P. Linder, Renee T. Mo, Vijay Narayanan +2 more | 2009-11-03 |
| 7598545 | Using metal/metal nitride bilayers as gate electrodes in self-aligned aggressively scaled CMOS devices | Eduard A. Cartier, Matthew W. Copel, Bruce B. Doris, Rajarao Jammy, Young-Hee Kim +3 more | 2009-10-06 |
| 7569466 | Dual metal gate self-aligned integration | Alessandro C. Callegari, Michael P. Chudzik, Bruce B. Doris, Vijay Narayanan, Michelle L. Steen | 2009-08-04 |