QL

Qinghuang Lin

IBM: 114 patents #453 of 70,183Top 1%
Globalfoundries: 9 patents #393 of 4,424Top 9%
BS Boston Scientific: 6 patents #119 of 370Top 35%
Lam Research: 2 patents #1,015 of 2,128Top 50%
Samsung: 2 patents #37,631 of 75,807Top 50%
GU Globalfoundries U.S.: 1 patents #22 of 211Top 15%
📍 Yorktown Heights, NY: #14 of 858 inventorsTop 2%
🗺 New York: #294 of 115,490 inventorsTop 1%
Overall (All Time): #7,729 of 4,157,543Top 1%
135
Patents All Time

Issued Patents All Time

Showing 101–125 of 135 patents

Patent #TitleCo-InventorsDate
8163658 Multiple patterning using improved patternable low-k dielectric materials 2012-04-24
8101236 Method of fabricating a SiCOH dielectric material with improved toughness and improved Si-C bonding Daniel C. Edelstein, Stephen M. Gates, Alfred Grill, Michael Lane, Robert D. Miller +2 more 2012-01-24
8084862 Interconnect structures with patternable low-k dielectrics and method of fabricating same Shyng-Tsong Chen 2011-12-27
8029971 Photopatternable dielectric materials for BEOL applications and methods for use Robert David Allen, Phillip Brock, Blake Davis, Robert D. Miller, Alshakim Nelson +1 more 2011-10-04
8017522 Mechanically robust metal/low-κ interconnects Terry A. Spooner, Darshan Gandhi, Christy S. Tyberg 2011-09-13
7944055 Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures Robert David Allen, Phillip Brock, Blake Davis, Wu-Song Huang, Alshakim Nelson +2 more 2011-05-17
7919225 Photopatternable dielectric materials for BEOL applications and methods for use Robert David Allen, Phillip Brock, Blake Davis, Geraud Jean-Michel Dubois, Robert D. Miller +3 more 2011-04-05
7867689 Method of use for photopatternable dielectric materials for BEOL applications Robert David Allen, Phillip Brock, Blake Davis, Robert D. Miller, Alshakim Nelson +1 more 2011-01-11
7816253 Surface treatment of inter-layer dielectric Shyng-Tsong Chen, Kelly Malone, Sanjay C. Mehta, Terry A. Spooner, Chih-Chao Yang 2010-10-19
7811923 Integrated wafer processing system for integration of patternable dielectric materials Sampath Purushothaman, Robert L. Wisnieff 2010-10-12
7795740 Adhesion enhancement for metal/dielectric interface Chih-Chao Yang, Griselda Bonilla, Terry A. Spooner 2010-09-14
7736833 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, David R. Medeiros, Wayne M. Moreau +2 more 2010-06-15
7714079 Patternable low dielectric constant materials and their use in ULSI interconnection Ratnam Sooriyakumaran 2010-05-11
7709370 Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures Robert David Allen, Phillip Brock, Blake Davis, Wu-Song Huang, Alshakim Nelson +2 more 2010-05-04
7709177 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, David R. Medeiros, Wayne M. Moreau +2 more 2010-05-04
7666794 Multiple patterning using patternable low-k dielectric materials 2010-02-23
7598169 Method to remove beol sacrificial materials and chemical residues by irradiation Elbert E. Huang, Christy S. Tyberg, Ronald A. DellaGuardia 2009-10-06
7479306 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same Daniel C. Edelstein, Stephen M. Gates, Alfred Grill, Michael Lane, Robert D. Miller +2 more 2009-01-20
7446058 Adhesion enhancement for metal/dielectric interface Chih-Chao Yang, Griselda Bonilla, Terry A. Spooner 2008-11-04
7361444 Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, David R. Medeiros, Wayne M. Moreau +2 more 2008-04-22
7306853 Patternable low dielectric constant materials and their use in ULSI interconnection Ratnam Sooriyakumaran 2007-12-11
7214603 Method for fabricating interconnect structures with reduced plasma damage Ronald A. DellaGuardia, Elbert E. Huang, Robert D. Miller 2007-05-08
7141692 Molecular photoresists containing nonpolymeric silsesquioxanes Robert David Allen, Wu-Song Huang, Mahmoud Khojasteh, Dirk Pfeiffer, Ratnam Sooriyakumaran +1 more 2006-11-28
7041748 Patternable low dielectric constant materials and their use in ULSI interconnection Ratnam Sooriyakumaran 2006-05-09
6821718 Radiation sensitive silicon-containing negative resists and use thereof Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang +1 more 2004-11-23