Issued Patents All Time
Showing 126–135 of 135 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang +1 more | 2003-11-25 |
| 6344305 | Radiation sensitive silicon-containing resists | Ahmad D. Katnani, Douglas Charles LaTulipe, David E. Seeger, William R. Brunsvold, Ali Afzali-Ardakani | 2002-02-05 |
| 6340734 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Marie Angelopoulos, Ahmad D. Katnani, Ratnam Sooriyakumaran | 2002-01-22 |
| 6303263 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh | 2001-10-16 |
| 6303275 | Method for resist filling and planarization of high aspect ratio features | Robert A. Coles, John W. Golz, Alan C. Thomas, Christopher J. Waskiewicz, Teresa J. Wu | 2001-10-16 |
| 6258732 | Method of forming a patterned organic dielectric layer on a substrate | Rebecca D. Mih, Kevin S. Petrarca | 2001-07-10 |
| 6210856 | Resist composition and process of forming a patterned resist layer on a substrate | Timothy Hughes, George M. Jordhamo, Ahmad D. Katnani, Wayne M. Moreau, Niranjan M. Patel | 2001-04-03 |
| 6187505 | Radiation sensitive silicon-containing resists | Ahmad D. Katnani, Douglas Charles LaTulipe, David E. Seeger, William R. Brunsvold, Ali Afzali-Ardakani | 2001-02-13 |
| 6103447 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh | 2000-08-15 |
| 6087064 | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method | Marie Angelopoulos, Ahmad D. Katnani, Ratnam Sooriyakumaran | 2000-07-11 |