Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7243169 | Method, system and program for oscillation control of an internal process of a computer program | Matthew James Carroll, Christian M. Garcia-Arellano, Sam S. Lightstone, Adam J. Storm, Yixin Diao | 2007-07-10 |
| 7056782 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2006-06-06 |
| 7039559 | Methods and apparatus for performing adaptive and robust prediction | Steven E. Froehlich, Joseph L. Hellerstein, Edwin R. Lassettre, Todd W. Mummert | 2006-05-02 |
| 6936522 | Selective silicon-on-insulator isolation structure and method | An Steegen, Hsing-Jen Wann, Ying Zhang, Franz Zach, Robert C. Wong | 2005-08-30 |
| 6869899 | Lateral-only photoresist trimming for sub-80 nm gate stack | Arpan Mahorowala, Jung Hyuk YOON, Ying Zhang | 2005-03-22 |
| 6864041 | Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching | Jeffrey J. Brown, Sadanand V. Deshpande, David V. Horak, Len Yuan Tsou, Qingyun Yang +2 more | 2005-03-08 |
| 6743686 | Sacrificial polysilicon sidewall process and rapid thermal spike annealing for advance CMOS fabrication | Kam-Leung Lee, Ying Zhang, Edmund M. Sikorski | 2004-06-01 |
| 6732908 | High density raised stud microjoining system and methods of fabricating the same | Bruce K. Furman, Sherif A. Goma, Simon Karecki, John Harold Magerlein, Kevin S. Petrarca +4 more | 2004-05-11 |
| 6678569 | User configurable multivariate time series reduction tool control method | Raymond Bunkofske, John Z. Colt, Jr., James J. McGill, Nancy T. Pascoe, Marc A. Taubenblatt +1 more | 2004-01-13 |
| 6584368 | User configurable multivariate time series reduction tool control method | Raymond Bunkofske, John Z. Colt, Jr., James J. McGill, Nancy T. Pascoe, Marc A. Taubenblatt +1 more | 2003-06-24 |
| 6528363 | Fabrication of notched gates by passivating partially etched gate sidewalls and then using an isotropic etch | Victor Ku, Len Yuan Tsou, Ying Zhang | 2003-03-04 |
| 6521383 | Pattern density tailoring for etching of advanced lithographic masks | Douglas E. Benoit, Cameron Brooks | 2003-02-18 |
| 6518136 | Sacrificial polysilicon sidewall process and rapid thermal spike annealing for advance CMOS fabrication | Kam-Leung Lee, Ying Zhang, Edmund M. Sikorski | 2003-02-11 |
| 6442445 | User configurable multivariate time series reduction tool control method | Raymond Bunkofske, John Z. Colt, Jr., James J. McGill, Nancy T. Pascoe, Marc A. Taubenblatt +1 more | 2002-08-27 |
| 6365326 | Pattern density tailoring for etching of advanced lithographic mask | Douglas E. Benoit, Cameron Brooks | 2002-04-02 |
| 5716486 | Method and apparatus for tuning field for plasma processing using corrected electrode | Gary S. Selwyn, Manoj Dalvie, C. Richard Guarnieri, James J. McGill, Gary W. Rubolff | 1998-02-10 |