KC

Kangguo Cheng

IBM: 2575 patents #1 of 70,183Top 1%
Globalfoundries: 269 patents #3 of 4,424Top 1%
TE Tessera: 34 patents #14 of 271Top 6%
SS Stmicroelectronics Sa: 19 patents #57 of 1,676Top 4%
AS Adeia Semiconductor Solutions: 13 patents #1 of 57Top 2%
ET Elpis Technologies: 12 patents #1 of 121Top 1%
CEA: 6 patents #716 of 7,956Top 9%
GU Globalfoundries U.S.: 5 patents #206 of 665Top 35%
Samsung: 5 patents #22,466 of 75,807Top 30%
RE Renesas Electronics: 4 patents #1,016 of 4,529Top 25%
IB International Business: 1 patents #4 of 119Top 4%
📍 Schenectady, NY: #1 of 1,353 inventorsTop 1%
🗺 New York: #1 of 115,490 inventorsTop 1%
Overall (All Time): #5 of 4,157,543Top 1%
2819
Patents All Time

Issued Patents All Time

Showing 201–225 of 2,819 patents

Patent #TitleCo-InventorsDate
11495688 Source and drain epitaxy and isolation for gate structures Juntao Li, Peng Xu, Zhenxing Bi 2022-11-08
11495673 Vertical fin field effect transistor with a reduced gate-to-bottom source/drain parasitic capacitance Chen Zhang, Xin Miao, Wenyu Xu 2022-11-08
11489044 Nanosheet transistor bottom isolation Zhenxing Bi, Yi Song, Lijuan Zou 2022-11-01
11482617 Vertical transport field-effect transistor including replacement gate Ruilong Xie, Chen Zhang, Julien Frougier 2022-10-25
11482612 Vertical transistor having bottom spacers on source/drain regions with different heights along junction region Shogo Mochizuki, Juntao Li, Choonghyun Lee 2022-10-25
11476362 Vertical transistors with various gate lengths Juntao Li, Choonghyun Lee, Shogo Mochizuki 2022-10-18
11462631 Sublithography gate cut physical unclonable function Eric R. Miller, Fee Li Lie, Gauri Karve, Marc A. Bergendahl, John R. Sporre 2022-10-04
11456354 Bulk nanosheet with dielectric isolation Bruce B. Doris, Junli Wang 2022-09-27
11456181 Cross-bar fin formation Chanro Park, Ruilong Xie, Juntao Li 2022-09-27
11453911 DNA sequencing with stacked nanopores Zhenxing Bi, Juntao Li, Xin Miao 2022-09-27
11444083 Fabrication of fin field effect transistors utilizing different fin channel materials while maintaining consistent fin widths Juntao Li, Peng Xu 2022-09-13
11437489 Techniques for forming replacement metal gate for VFET Ruilong Xie, Heng Wu, Chanro Park 2022-09-06
11430864 VFET device with controllable top spacer Wenyu Xu, Chen Zhang, Xin Miao 2022-08-30
11430651 Nanosheet transistors with sharp junctions Lawrence A. Clevenger, Balasubramanian S. Pranatharthi Haran, John H. Zhang 2022-08-30
11430879 Method and structure for forming dielectric isolated FinFET with improved source/drain epitaxy Juntao Li 2022-08-30
11424343 Vertical fin field effect transistor devices with self-aligned source and drain junctions Juntao Li, Choonghyun Lee, Shogo Mochizuki 2022-08-23
11398347 Inductor with ferromagnetic cores Juntao Li, Geng Wang, Qintao Zhang 2022-07-26
11380842 Phase change memory cell with second conductive layer Juntao Li, Ruilong Xie, Junli Wang 2022-07-05
11380778 Vertical fin field effect transistor devices with self-aligned source and drain junctions Juntao Li, Choonghyun Lee, Shogo Mochizuki 2022-07-05
11380589 Selective removal of semiconductor fins Veeraraghavan S. Basker, Ali Khakifirooz 2022-07-05
11378545 Nanofluid sensor with real-time spatial sensing Ali Khakifirooz, Ghavam G. Shahidi, Davood Shahrjerdi 2022-07-05
11362194 Transistor having confined source/drain regions with wrap-around source/drain contacts Alexander Reznicek, Ruilong Xie, Marc A. Bergendahl 2022-06-14
11362193 Inverse T-shaped contact structures having air gap spacers Choonghyun Lee, Juntao Li, Heng Wu, Peng Xu 2022-06-14
11362093 Co-integration of non-volatile memory on gate-all-around field effect transistor Zhenxing Bi, Zheng Xu, Dexin Kong 2022-06-14
11361928 Piezoelectric vacuum transistor Qing Cao, Zhengwen Li, Fei Liu 2022-06-14