Issued Patents All Time
Showing 326–350 of 377 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7659583 | Ultrathin SOI CMOS devices employing differential STI liners | Zhibin Ren, Dinkar Singh, Jeffrey W. Sleight, Xinhui Wang | 2010-02-09 |
| 7592671 | Strained silicon-on-insulator by anodization of a buried p+ silicon germanium layer | Thomas N. Adam, Stephen W. Bedell, Joel P. de Souza, Keith E. Fogel, Alexander Reznicek +1 more | 2009-09-22 |
| 7566632 | Lock and key structure for three-dimensional chip connection and process thereof | Mary B. Rothwell, Roy Yu | 2009-07-28 |
| 7504311 | Structure and method of integrating compound and elemental semiconductors for high-performance CMOS | Steven J. Koester, Devendra K. Sadana | 2009-03-17 |
| 7501318 | Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal | Stephen W. Bedell, Keith E. Fogel, Devendra K. Sadana | 2009-03-10 |
| 7498235 | Method for fabricating SiGe-on-insulator (SGOI) and Ge-on-insulator (GOI) substrates | Tze-Chiang Chen, Guy M. Cohen, Alexander Reznicek, Devendra K. Sadana | 2009-03-03 |
| 7485539 | Strained semiconductor-on-insulator (sSOI) by a simox method | Thomas N. Adam, Stephen W. Bedell, Joel P. de Souza, Keith E. Fogel, Alexander Reznicek +1 more | 2009-02-03 |
| 7473975 | Fully silicided metal gate semiconductor device structure | Glenn A. Biery, Michelle L. Steen | 2009-01-06 |
| 7365378 | MOSFET structure with ultra-low K spacer | Elbert E. Huang, Philip J. Oldiges, Christy S. Tyberg, Xinlin Wang, Robert L. Wisnieff | 2008-04-29 |
| 7348633 | Hybrid crystallographic surface orientation substrate having one or more SOI regions and/or bulk semiconductor regions | Junedong Lee, Devendra K. Sadana, Dominic J. Schepis | 2008-03-25 |
| 7317226 | Patterned SOI by oxygen implantation and annealing | Keith E. Fogel, Mark C. Hakey, Steven J. Holmes, Devendra K. Sadana | 2008-01-08 |
| 7315065 | Method for fabricating SiGe-on-insulator (SGOI) and Ge-on-insulator (GOI) substrates | Tze-Chiang Chen, Guy M. Cohen, Alexander Reznicek, Devendra K. Sadana | 2008-01-01 |
| 7282425 | Structure and method of integrating compound and elemental semiconductors for high-performance CMOS | Steven J. Koester, Devendra K. Sadana | 2007-10-16 |
| 7273777 | Formation of fully silicided (FUSI) gate using a dual silicide process | Glenn A. Biery, Michelle L. Steen | 2007-09-25 |
| 7271455 | Formation of fully silicided metal gate using dual self-aligned silicide process | Cyril Cabral, Jr., Chester T. Dziobkowski, Sunfei Fang, Evgeni Gousev, Rajarao Jammy +4 more | 2007-09-18 |
| 7172930 | Strained silicon-on-insulator by anodization of a buried p+ silicon germanium layer | Thomas N. Adam, Stephen W. Bedell, Joel P. de Souza, Keith E. Fogel, Alexander Reznicek +1 more | 2007-02-06 |
| 7163866 | SOI MOSFETS exhibiting reduced floating-body effects | Fariborz Assaderaghi, Werner Rausch, Dominic J. Schepis | 2007-01-16 |
| 7141457 | Method to form Si-containing SOI and underlying substrate with different orientations | Meikei Ieong, Devendra K. Sadana | 2006-11-28 |
| 7084050 | Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal | Stephen W. Bedell, Joel P. de Souza, Keith E. Fogel, Devendra K. Sadana | 2006-08-01 |
| 7084460 | Method for fabricating SiGe-on-insulator (SGOI) and Ge-on-insulator (GOI) substrates | Tze-Chiang Chen, Guy M. Cohen, Alexander Reznicek, Devendra K. Sadana | 2006-08-01 |
| 7002214 | Ultra-thin body super-steep retrograde well (SSRW) FET devices | Diane C. Boyd, Judson R. Holt, Meikei Ieong, Renee T. Mo, Zhibin Ren | 2006-02-21 |
| 6891228 | CMOS device on ultrathin SOI with a deposited raised source/drain, and a method of manufacture | Heemyong Park, Byoung Hun Lee, Paul D. Agnello, Dominic J. Schepis | 2005-05-10 |
| 6861158 | Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal | Stephen W. Bedell, Joel P. de Souza, Keith E. Fogel, Devendra K. Sadana | 2005-03-01 |
| 6855436 | Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal | Stephen W. Bedell, Keith E. Fogel, Devendra K. Sadana | 2005-02-15 |
| 6846727 | Patterned SOI by oxygen implantation and annealing | Keith E. Fogel, Mark C. Hakey, Steven J. Holmes, Devendra K. Sadana | 2005-01-25 |