Issued Patents All Time
Showing 126–142 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10361127 | Vertical transport FET with two or more gate lengths | Gauri Karve, Fee Li Lie, Indira Seshadri, Mona A. Ebrish, Leigh Anne H. Clevenger +1 more | 2019-07-23 |
| 10354885 | Hard masks for block patterning | Isabel C. Estrada-Raygoza, Yann Mignot, Indira Seshadri, Yongan Xu | 2019-07-16 |
| 10354922 | Simplified block patterning with wet strippable hardmask for high-energy implantation | Indira Seshadri, Romain Lallement, Nelson Felix | 2019-07-16 |
| 10347486 | Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography | Dario L. Goldfarb, Nelson Felix, Daniel A. Corliss, Rudy J. Wojtecki | 2019-07-09 |
| 10347540 | Gate cut using selective deposition to prevent oxide loss | Andrew M. Greene, Siva Kanakasabapathy | 2019-07-09 |
| 10312140 | Dielectric gap fill evaluation for integrated circuits | Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Gauri Karve, Fee Li Lie +3 more | 2019-06-04 |
| 10304744 | Inverse tone direct print EUV lithography enabled by selective material deposition | Praveen Joseph, Fee Li Lie, Stuart A. Sieg, Yann Mignot, Indira Seshadri | 2019-05-28 |
| 10276452 | Low undercut N-P work function metal patterning in nanosheet replacement metal gate process | Indira Seshadri, Jing Guo, Romain Lallement, Ruqiang Bao, Zhenxing Bi +1 more | 2019-04-30 |
| 10254652 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Karen E. Petrillo, Indira Seshadri | 2019-04-09 |
| 10249512 | Tunable TiOxNy hardmask for multilayer patterning | Abraham Arceo de la Pena, Nelson Felix, Sivananda K. Kanakasabapathy | 2019-04-02 |
| 10176997 | Direct gate patterning for vertical transport field effect transistor | Indira Seshadri, Stuart A. Sieg, Wenyu Xu | 2019-01-08 |
| 10170582 | Uniform bottom spacer for vertical field effect transistor | Michael P. Belyansky, Cheng Chi, Tenko Yamashita | 2019-01-01 |
| 10090164 | Hard masks for block patterning | Isabel C. Estrada-Raygoza, Yann Mignot, Indira Seshadri, Yongan Xu | 2018-10-02 |
| 10082736 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Karen E. Petrillo, Indira Seshadri | 2018-09-25 |
| 9941142 | Tunable TiOxNy hardmask for multilayer patterning | Abraham Arceo de la Pena, Nelson Felix, Sivananda K. Kanakasabapathy | 2018-04-10 |
| 9799534 | Application of titanium-oxide as a patterning hardmask | Abraham Arceo de la Pena, Nelson Felix, Sivananda K. Kanakasabapathy, Indira Seshadri | 2017-10-24 |
| 7452658 | Molecular glass photoresists | Drew C. Forman, Christopher K. Ober | 2008-11-18 |