DS

Devendra K. Sadana

IBM: 797 patents #8 of 70,183Top 1%
Globalfoundries: 22 patents #130 of 4,424Top 3%
KT King Abdulaziz City For Science And Technology: 14 patents #6 of 573Top 2%
BC Bay Zu Precision Co.: 7 patents #1 of 12Top 9%
EC Egypt Nanotechnology Center: 3 patents #12 of 29Top 45%
MT Matheson Tri-Gas: 3 patents #10 of 47Top 25%
HL Hefechip Corporation Limited: 2 patents #10 of 16Top 65%
GU George Washington University: 2 patents #62 of 325Top 20%
NV NVIDIA: 1 patents #4,316 of 7,811Top 60%
ET Elpis Technologies: 1 patents #31 of 121Top 30%
IM International Machines: 1 patents #1 of 34Top 3%
MIT: 1 patents #4,386 of 9,367Top 50%
TC Toshiba America Electronic Components: 1 patents #23 of 77Top 30%
UE US Dept of Energy: 1 patents #1,355 of 5,099Top 30%
📍 Pleasantville, NY: #1 of 229 inventorsTop 1%
🗺 New York: #7 of 115,490 inventorsTop 1%
Overall (All Time): #99 of 4,157,543Top 1%
826
Patents All Time

Issued Patents All Time

Showing 776–800 of 826 patents

Patent #TitleCo-InventorsDate
6888221 BICMOS technology on SIMOX wafers Alvin J. Joseph, Qizhi Liu 2005-05-03
6884667 Field effect transistor with stressed channel and method for making same Bruce B. Doris, Dureseti Chidambarrao, Xavier Baie, Jack A. Mandelman, Dominic J. Schepis 2005-04-26
6878611 Patterned strained silicon for high performance circuits Stephen W. Bedell, Tze-Chiang Chen, Kwang Su Choe, Keith E. Fogel 2005-04-12
6875982 Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X Stephen W. Bedell, John Bruley, Anthony G. Domenicucci 2005-04-05
6861158 Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal Stephen W. Bedell, Joel P. de Souza, Keith E. Fogel, Ghavam G. Shahidi 2005-03-01
6855436 Formation of silicon-germanium-on-insulator (SGOI) by an integral high temperature SIMOX-Ge interdiffusion anneal Stephen W. Bedell, Keith E. Fogel, Ghavam G. Shahidi 2005-02-15
6846727 Patterned SOI by oxygen implantation and annealing Keith E. Fogel, Mark C. Hakey, Steven J. Holmes, Ghavam G. Shahidi 2005-01-25
6841457 Use of hydrogen implantation to improve material properties of silicon-germanium-on-insulator material made by thermal diffusion Stephen W. Bedell, Keith E. Fogel 2005-01-11
6835983 Silicon-on-insulator (SOI) integrated circuit (IC) chip with the silicon layers consisting of regions of different thickness Tak H. Ning 2004-12-28
6825102 Method of improving the quality of defective semiconductor material Stephen W. Bedell, Keith E. Fogel, Shreesh Narasimha 2004-11-30
6812114 Patterned SOI by formation and annihilation of buried oxide regions during processing Tze-Chiang Chen 2004-11-02
6805962 Method of creating high-quality relaxed SiGe-on-insulator for strained Si CMOS applications Stephen W. Bedell, Jack O. Chu, Keith E. Fogel, Steven J. Koester, John A. Ott 2004-10-19
6803240 Method of measuring crystal defects in thin Si/SiGe bilayers Stephen W. Bedell, Keith E. Fogel 2004-10-12
6800518 Formation of patterned silicon-on-insulator (SOI)/silicon-on-nothing (SON) composite structure by porous Si engineering Robert E. Bendernagel, Kwang Su Choe, Bijan Davari, Keith E. Fogel, Ghavam G. Shahidi +1 more 2004-10-05
6784072 Control of buried oxide in SIMOX Stephen Fox, Neena Garg, Kenneth J. Giewont, Junedong Lee, Siegfried Maurer +2 more 2004-08-31
6756639 Control of buried oxide quality in low dose SIMOX Maurice Heathcote Norcott 2004-06-29
6756257 Patterned SOI regions on semiconductor chips Bijan Davari, Ghavam G. Shahidi, Sandip Tiwari 2004-06-29
6743651 Method of forming a SiGe-on-insulator substrate using separation by implantation of oxygen Jack O. Chu, Feng-Yi Huang, Steven J. Koester 2004-06-01
6717216 SOI based field effect transistor having a compressive film in undercut area under the channel and a method of making the device Bruce B. Doris, Dureseti Chidambarrao, Xavier Baie, Jack A. Mandelman, Dominic J. Schepis 2004-04-06
6717217 Ultimate SIMOX Keith E. Fogel, Maurice Heathcote Norcott 2004-04-06
6657261 Ground-plane device with back oxide topography Fariborz Assaderaghi, Tze-Chiang Chen, K. Paul Muller, Edward J. Nowak, Ghavam G. Shahidi 2003-12-02
6642090 Fin FET devices from bulk semiconductor and method for forming David M. Fried, Edward J. Nowak, Beth Ann Rainey 2003-11-04
6602757 Self-adjusting thickness uniformity in SOI by high-temperature oxidation of SIMOX and bonded SOI Harold J. Hovel 2003-08-05
6593205 Patterned SOI by formation and annihilation of buried oxide regions during processing Tze-Chiang Chen 2003-07-15
6566177 Silicon-on-insulator vertical array device trench capacitor DRAM Carl Radens, Gary B. Bronner, Tze-Chiang Chen, Bijan Davari, Jack A. Mandelman +3 more 2003-05-20