Issued Patents All Time
Showing 26–50 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7563558 | Negative resists based on acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran | 2009-07-21 |
| 7521172 | Topcoat material and use thereof in immersion lithography processes | Robert Allen David, Phillip Brock, Sean D. Burns, Dario L. Goldfarb, Dirk Pfeiffer +3 more | 2009-04-21 |
| 7456045 | Low temperature melt-processing of organic-inorganic hybrid | Patrick W. DeHaven, David B. Mitzi | 2008-11-25 |
| 7393624 | Negative resists based on acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran | 2008-07-01 |
| 7361444 | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof | Marie Angelopoulos, Katherina Babich, Douglas Charles LaTulipe, Qinghuang Lin, Wayne M. Moreau +2 more | 2008-04-22 |
| 7329596 | Method for tuning epitaxial growth by interfacial doping and structure including same | Katherina Babich, Bruce B. Doris, Devendra K. Sadana | 2008-02-12 |
| 7314700 | High sensitivity resist compositions for electron-based lithography | Wu-Song Huang, Wenjie Li, Wayne M. Moreau, Karen E. Petrillo, Robert N. Lang +1 more | 2008-01-01 |
| 7312524 | Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made | Stephen M. Gates, Alfred Grill, Deborah Newmayer, Son V. Nguyen, Vishnubhai V. Patel +1 more | 2007-12-25 |
| 7300739 | Negative resists based on a acid-catalyzed elimination of polar molecules | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran | 2007-11-27 |
| 7300741 | Advanced chemically amplified resist for sub 30 nm dense feature resolution | Wu-Song Huang, Gregory Michael Wallraff | 2007-11-27 |
| 7291516 | Low temperature melt-processing of organic-inorganic hybrid | Patrick W. DeHaven, David B. Mitzi | 2007-11-06 |
| 7223517 | Lithographic antireflective hardmask compositions and uses thereof | Katherina Babich, Arpan Mahorowala, Dirk Pfeiffer | 2007-05-29 |
| 7176484 | Use of an energy source to convert precursors into patterned semiconductors | Ali Afzali-Ardakani, Hendrik F. Hamann, James A. Lacey, Praveen Chaudhari, Robert J. von Gutfeld | 2007-02-13 |
| 7172849 | Antireflective hardmask and uses thereof | Katherina Babich, Elbert E. Huang, Arpan Mahorowala, Dirk Pfeiffer, Karen Temple | 2007-02-06 |
| 7168224 | Method of making a packaged radiation sensitive resist film-coated workpiece | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau, Karen E. Petrillo +2 more | 2007-01-30 |
| 7135595 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-11-14 |
| 7105360 | Low temperature melt-processing of organic-inorganic hybrid | Patrick W. DeHaven, David B. Mitzi | 2006-09-12 |
| 7090963 | Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging | Wu-Song Huang, Gregory Michael Wallraff, Bill Hinsberg, Frances Anne Houle | 2006-08-15 |
| 7053401 | Synthesis and application of photosensitive pentacene precursor in organic thin film transistors | Ali Ardakani, Christos D. Dimitrakopoulos, Teresita O. Graham | 2006-05-30 |
| 7049247 | Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made | Stephen M. Gates, Alfred Grill, Deborah A. Neumayer, Son V. Nguyen, Vishnubhai V. Patel +1 more | 2006-05-23 |
| 7014980 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-03-21 |
| 6927015 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more | 2005-08-09 |
| 6818381 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold +4 more | 2004-11-16 |
| 6806026 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2004-10-19 |
| 6730454 | Antireflective SiO-containing compositions for hardmask layer | Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu-Song Huang +2 more | 2004-05-04 |