Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6689540 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong | 2004-02-10 |
| 6686124 | Multifunctional polymeric materials and use thereof | Marie Angelopoulos, Katherina Babich, Wayne M. Moreau | 2004-02-03 |
| 6673521 | Supercritical fluid(SCF) silylation process | Wayne M. Moreau, Kenneth McCullough, John P. Simons, Charles J. Taft | 2004-01-06 |
| 6641971 | Resist compositions comprising silyl ketals and methods of use thereof | Wu-Song Huang | 2003-11-04 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang +3 more | 2003-07-01 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau, Karen E. Petrillo +2 more | 2003-04-08 |
| 6541398 | Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same | Alfred Grill, Vishnubhai V. Patel | 2003-04-01 |
| 6509136 | Process of drying a cast polymeric film disposed on a workpiece | Dario L. Goldfarb, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2003-01-21 |
| 6495825 | Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis | Mark S. Chace, John E. Darney, Wayne M. Moreau, Alfred Oscar Passano | 2002-12-17 |
| 6441491 | Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same | Alfred Grill, Vishnubhai V. Patel | 2002-08-27 |
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong +3 more | 2002-07-16 |
| 6346362 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong | 2002-02-12 |
| 5362600 | Radiation sensitive compositions comprising polymer having acid labile groups | Roger F. Sinta, Richard C. Hemond, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro | 1994-11-08 |
| 5258257 | Radiation sensitive compositions comprising polymer having acid labile groups | Roger F. Sinta, Richard C. Hemond, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro | 1993-11-02 |