Issued Patents All Time
Showing 101–113 of 113 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6853204 | Wafer inspection method of charging wafer with a charged particle beam then measuring electric properties thereof, and inspection device based thereon | Mari Nozoe | 2005-02-08 |
| 6797975 | Method and its apparatus for inspecting particles or defects of a semiconductor device | Minori Noguchi, Yoshimasa Ooshima, Akira Hamamatsu, Kenji Watanabe, Tetsuya Watanabe +1 more | 2004-09-28 |
| 6777677 | Method of inspecting pattern and inspecting instrument | Mari Nozoe, Shigeaki Hijikata, Kenji Watanabe, Koji Abe | 2004-08-17 |
| 6731384 | Apparatus for detecting foreign particle and defect and the same method | Yoshimasa Ohshima, Minori Noguchi, Kenji Mitomo, Takashi Okawa, Akira Hamamatsu +1 more | 2004-05-04 |
| 6650409 | Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system | Minori Noguchi, Yukio Kembo, Hiroshi Morioka, Hideaki Doi, Masataka Shiba +6 more | 2003-11-18 |
| 6618850 | Inspection method and inspection system using charged particle beam | Mari Nozoe, Hiroyuki Shinada | 2003-09-09 |
| 6597448 | Apparatus and method of inspecting foreign particle or defect on a sample | Minori Noguchi, Yoshimasa Ohshima, Tetsuya Watanabe, Hisato Nakamura, Takahiro Jingu +3 more | 2003-07-22 |
| 6586952 | Method of inspecting pattern and inspecting instrument | Mari Nozoe, Mitsuo Suga, Yoichiro Neo | 2003-07-01 |
| 6583414 | Method of inspecting pattern and inspecting instrument | Mari Nozoe, Shigeaki Hijikata, Kenji Watanabe, Koji Abe | 2003-06-24 |
| 6411377 | Optical apparatus for defect and particle size inspection | Minori Noguchi, Yoshimasa Ohshima, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga +7 more | 2002-06-25 |
| 5725933 | Working protection cover and parts thereof and method of manufacturing the working protection cover | — | 1998-03-10 |
| 5585179 | Working protection cover and parts thereof, and method of manufacturing the working protection cover | — | 1996-12-17 |
| 5463459 | Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process | Hiroshi Morioka, Minori Noguchi, Yoshimasa Ohshima, Yukio Kembo, Kazuhiko Matsuoka +1 more | 1995-10-31 |