Issued Patents All Time
Showing 676–700 of 767 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7413941 | Method of fabricating sectional field effect devices | Ying Zhang, Thomas S. Kanarsky, Meikei Ieong, Jakub Kedzierski | 2008-08-19 |
| 7388259 | Strained finFET CMOS device structures | Dureseti Chidambarrao, Meikei Ieong, Jack A. Mandelman | 2008-06-17 |
| 7388257 | Multi-gate device with high k dielectric for channel top surface | Oleg Gluschenkov, Ying Zhang, Huilong Zhu | 2008-06-17 |
| 7388258 | Sectional field effect devices | Ying Zhang, Thomas S. Kanarsky, Meikei Ieong, Jakub Kedzierski | 2008-06-17 |
| 7374987 | Stress inducing spacers | Dureseti Chidambarrao, Omer H. Dokumaci, Jack A. Mandelman, Xavier Baie | 2008-05-20 |
| 7354806 | Semiconductor device structure with active regions having different surface directions and methods | Oleg Gluschenkov, Meikei Ieong, Effendi Leobandung, Huilong Zhu | 2008-04-08 |
| 7348641 | Structure and method of making double-gated self-aligned finFET having gates of different lengths | Huilong Zhu, Xinlin Wang, Jochen Beintner, Ying Zhang, Philip J. Oldiges | 2008-03-25 |
| 7348629 | Metal gated ultra short MOSFET devices | Jack O. Chu, Meikei Ieong, Jing Wang | 2008-03-25 |
| 7329923 | High-performance CMOS devices on hybrid crystal oriented substrates | Kathryn Guarini, Meikei Ieong, Shreesh Narasimha, Kern Rim, Jeffrey W. Sleight +1 more | 2008-02-12 |
| 7329596 | Method for tuning epitaxial growth by interfacial doping and structure including same | Katherina Babich, David R. Medeiros, Devendra K. Sadana | 2008-02-12 |
| 7326997 | Method and structure for enhancing both nMOSFET and pMOSFET performance with a stressed film | Huilong Zhu, Jing Wang, Zhibin Ren | 2008-02-05 |
| 7314802 | Structure and method for manufacturing strained FINFET | Huilong Zhu | 2008-01-01 |
| 7314789 | Structure and method to generate local mechanical gate stress for MOSFET channel mobility modification | Cyril Cabral, Jr., Thomas S. Kanarsky, Xiao Hu Liu, Huilong Zhu | 2008-01-01 |
| 7312134 | Dual stressed SOI substrates | Dureseti Chidambarrao, Omer H. Dokumaci, Oleg Gluschenkov, Huilong Zhu | 2007-12-25 |
| 7291886 | Hybrid substrate technology for high-mobility planar and multiple-gate MOSFETs | Meikei Ieong, Edward J. Nowak, Min Yang | 2007-11-06 |
| 7285826 | High mobility CMOS circuits | Oleg Gluschenkov, Huilong Zhu | 2007-10-23 |
| 7279746 | High performance CMOS device structures and method of manufacture | Dureseti Chidambarrao, Suk Hoon Ku | 2007-10-09 |
| 7271049 | Method of forming self-aligned low-k gate cap | Oleg Gluschenkov, Jack A. Mandelman, Michael P. Belyansky | 2007-09-18 |
| 7271043 | Method for manufacturing strained silicon directly-on-insulator substrate with hybrid crystalline orientation and different stress levels | Huilong Zhu, Huajie Chen, Patricia M. Mooney, Stephen W. Bedell | 2007-09-18 |
| 7271446 | Ultra-thin channel device with raised source and drain and solid source extension doping | Omer H. Dokumaci | 2007-09-18 |
| 7262084 | Methods for manufacturing a finFET using a conventional wafer and apparatus manufactured therefrom | Huilong Zhu | 2007-08-28 |
| 7262087 | Dual stressed SOI substrates | Dureseti Chidambarrao, Oleg Gluschenkov, Omer H. Dokumaci, Huilong Zhu | 2007-08-28 |
| 7250658 | Hybrid planar and FinFET CMOS devices | Diane C. Boyd, Meikei Leong, Thomas S. Kanarsky, Jakub Kedzierski, Min Yang | 2007-07-31 |
| 7247569 | Ultra-thin Si MOSFET device structure and method of manufacture | Diane C. Boyd, Meikei Ieong, Devendra K. Sadana | 2007-07-24 |
| 7247912 | Structures and methods for making strained MOSFETs | Hiulong Zhu, Steven Bedell, Ying Zhang | 2007-07-24 |