Issued Patents All Time
Showing 26–50 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7179700 | Semiconductor device with low resistance contacts | William J. Taylor, Jr. | 2007-02-20 |
| 7144825 | Multi-layer dielectric containing diffusion barrier material | Tien Ying Luo, Hsing-Huang Tseng | 2006-12-05 |
| 7132360 | Method for treating a semiconductor surface to form a metal-containing layer | James K. Schaeffer, Darrell Roan, Dina H. Triyoso | 2006-11-07 |
| 7109079 | Metal gate transistor CMOS process and method for making | James K. Schaeffer | 2006-09-19 |
| 7074664 | Dual metal gate electrode semiconductor fabrication process and structure thereof | Ted R. White, Robert E. Jones | 2006-07-11 |
| 7071038 | Method of forming a semiconductor device having a dielectric layer with high dielectric constant | Dina H. Triyoso, Randy W. Cotton | 2006-07-04 |
| 7045432 | Method for forming a semiconductor device with local semiconductor-on-insulator (SOI) | Marius Orlowski, Alexander L. Barr | 2006-05-16 |
| 7037795 | Low RC product transistors in SOI semiconductor process | Alexander L. Barr, Bich-Yen Nguyen, Marius Orlowski, Mariam Sadaka, Voon-Yew Thean +1 more | 2006-05-02 |
| 7030001 | Method for forming a gate electrode having a metal | Lynne Michaelson, Kathleen C. Yu, Robert E. Jones | 2006-04-18 |
| 7015153 | Method for forming a layer using a purging gas in a semiconductor process | Dina H. Triyoso, David C. Gilmer, Darrell Roan, James K. Schaeffer, Philip J. Tobin +1 more | 2006-03-21 |
| 7001852 | Method of making a high quality thin dielectric layer | Tien Ying Luo, Hsing-Huang Tseng | 2006-02-21 |
| 6987063 | Method to reduce impurity elements during semiconductor film deposition | James K. Schaeffer, Dina H. Triyoso | 2006-01-17 |
| 6933227 | Semiconductor device and method of forming the same | Kevin Lucas | 2005-08-23 |
| 6908852 | Method of forming an arc layer for a semiconductor device | Donald O. Arugu | 2005-06-21 |
| 6902969 | Process for forming dual metal gate structures | Hsing-Huang Tseng, Wei E. Wu | 2005-06-07 |
| 6897095 | Semiconductor process and integrated circuit having dual metal oxide gate dielectric with single metal gate electrode | Srikanth B. Samavedam, Bruce E. White | 2005-05-24 |
| 6881681 | Film deposition on a semiconductor wafer | Marc Rossow, Anna Phillips | 2005-04-19 |
| 6849487 | Method for forming an electronic structure using etch | William J. Taylor, Jr., Steven G. H. Anderson | 2005-02-01 |
| 6790719 | Process for forming dual metal gate structures | Eric D. Luckowski, Srikanth B. Samavedam, Arturo Martinez | 2004-09-14 |
| 6713381 | Method of forming semiconductor device including interconnect barrier layers | Alexander L. Barr, Suresh Venkatesan, David B. Clegg, Rebecca G. Cole, Stuart E. Greer +5 more | 2004-03-30 |
| 6686282 | Plated metal transistor gate and method of formation | Cindy Reidsema Simpson, Hsing-Huang Tseng | 2004-02-03 |
| 6423619 | Transistor metal gate structure that minimizes non-planarity effects and method of formation | John M. Grant, Yolanda Musgrove | 2002-07-23 |
| 6376349 | Process for forming a semiconductor device and a conductive structure | Philip J. Tobin, Bikas Maiti | 2002-04-23 |
| 6369430 | Method of preventing two neighboring contacts from a short-circuit caused by a void between them and device having the same | Yeong-Jyh T. Lii, Paul A. Grudowski | 2002-04-09 |
| 6294820 | Metallic oxide gate electrode stack having a metallic gate dielectric metallic gate electrode and a metallic arc layer | Kevin Lucas, Christopher C. Hobbs, Yolanda Musgrove, Yeong-Jyh T. Lii | 2001-09-25 |