| 8445939 |
Method of forming a semiconductor device and semiconductor device |
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2013-05-21 |
| 8076189 |
Method of forming a semiconductor device and semiconductor device |
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2011-12-13 |
| 8039339 |
Separate layer formation in a semiconductor device |
Srikanth B. Samavedam, Suresh Venkatesan |
2011-10-18 |
| 7879663 |
Trench formation in a semiconductor material |
Mark D. Hall, Glenn C. Abeln |
2011-02-01 |
| 7790528 |
Dual substrate orientation or bulk on SOI integrations using oxidation for silicon epitaxy spacer formation |
Gregory S. Spencer, Gauri Karve |
2010-09-07 |
| 7015517 |
Semiconductor device incorporating a defect controlled strained channel structure and method of making the same |
Tab A. Stephens |
2006-03-21 |
| 6919258 |
Semiconductor device incorporating a defect controlled strained channel structure and method of making the same |
Tab A. Stephens |
2005-07-19 |
| 6908822 |
Semiconductor device having an insulating layer and method for forming |
Michael Rendon, Ross E. Noble |
2005-06-21 |
| 6891229 |
Inverted isolation formed with spacers |
Andrea Franke, Jonathan Cobb, Al T. Koh, Yeong-Jyh T. Lii, Bich-Yen Nguyen +1 more |
2005-05-10 |
| 6831350 |
Semiconductor structure with different lattice constant materials and method for forming the same |
Chun-Li Liu, Alexander L. Barr, Bich-Yen Nguyen, Marius Orlowski, Tab A. Stephens +2 more |
2004-12-14 |
| 6551922 |
Method for making a semiconductor device by variable chemical mechanical polish downforce |
Thomas S. Kobayashi |
2003-04-22 |
| 6423619 |
Transistor metal gate structure that minimizes non-planarity effects and method of formation |
Olubunmi O. Adetutu, Yolanda Musgrove |
2002-07-23 |
| 5736002 |
Methods and equipment for anisotropic, patterned conversion of copper into selectively removable compounds and for removal of same |
Lynn R. Allen |
1998-04-07 |