YL

Yeong-Jyh T. Lii

Motorola: 10 patents #938 of 12,470Top 8%
FS Freeescale Semiconductor: 5 patents #628 of 3,767Top 20%
AM AMD: 1 patents #5,683 of 9,279Top 65%
IBM: 1 patents #44,794 of 70,183Top 65%
📍 Peekskill, NY: #41 of 232 inventorsTop 20%
🗺 New York: #9,079 of 115,490 inventorsTop 8%
Overall (All Time): #301,588 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
7176574 Semiconductor device having a multiple thickness interconnect Kathleen C. Yu, Kirk Strozewski, János Farkas, Hector Sanchez 2007-02-13
6891229 Inverted isolation formed with spacers Andrea Franke, Jonathan Cobb, John M. Grant, Al T. Koh, Bich-Yen Nguyen +1 more 2005-05-10
6838354 Method for forming a passivation layer for air gap formation Cindy Goldberg, Stanley M. Filipiak, John C. Flake, Bradley P. Smith, Yuri Solomentsev +3 more 2005-01-04
6815820 Method for forming a semiconductor interconnect with multiple thickness Kathleen C. Yu, Kirk Strozewski, János Farkas, Hector Sanchez 2004-11-09
6774053 Method and structure for low-k dielectric constant applications Errol Todd Ryan, Cindy Goldberg, Yuri Solomentsev 2004-08-10
6689676 Method for forming a semiconductor device structure in a semiconductor layer Daniel T. Pham, Al T. Koh, Robert F. Steimle, Anne Vandooren, Ricardo Garcia +3 more 2004-02-10
6686633 Semiconductor device, memory cell, and processes for forming them Craig S. Lage, Mousumi Bhat, Andrew G. Nagy, Larry E. Frisa, Stanley M. Filipiak +5 more 2004-02-03
6369430 Method of preventing two neighboring contacts from a short-circuit caused by a void between them and device having the same Olubunmi O. Adetutu, Paul A. Grudowski 2002-04-09
6362071 Method for forming a semiconductor device with an opening in a dielectric layer Bich-Yen Nguyen, William J. Taylor, Jr., Philip J. Tobin, David L. O'Meara, Percy V. Gilbert +1 more 2002-03-26
6294820 Metallic oxide gate electrode stack having a metallic gate dielectric metallic gate electrode and a metallic arc layer Kevin Lucas, Olubunmi O. Adetutu, Christopher C. Hobbs, Yolanda Musgrove 2001-09-25
6287951 Process for forming a combination hardmask and antireflective layer Kevin Lucas, Christopher D. Pettinato, Wayne Clark, Stanley M. Filipiak 2001-09-11
6184073 Process for forming a semiconductor device having an interconnect or conductive film electrically insulated from a conductive member or region Craig S. Lage, Mousumi Bhat, Andrew G. Nagy, Larry E. Frisa, Stanley M. Filipiak +5 more 2001-02-06
6146948 Method for manufacturing a thin oxide for use in semiconductor integrated circuits Wei E. Wu, Hsing-Huang Tseng, Phillip E. Crabtree 2000-11-14
6004850 Tantalum oxide anti-reflective coating (ARC) integrated with a metallic transistor gate electrode and method of formation Kevin Lucas, Olubunmi O. Adetutu, Christopher C. Hobbs, Yolanda Musgrove 1999-12-21
5888588 Process for forming a semiconductor device Rajan Nagabushnam, Olubunmi O. Adetutu 1999-03-30
5378312 Process for fabricating a semiconductor structure having sidewalls George G. Gifford, Jin J. Wu 1995-01-03