Issued Patents All Time
Showing 26–50 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10262865 | Methods for manufacturing semiconductor devices | Toshihisa Nozawa | 2019-04-16 |
| 10186420 | Formation of silicon-containing thin films | — | 2019-01-22 |
| 10179947 | Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition | — | 2019-01-15 |
| 10147600 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2018-12-04 |
| 9905416 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Hideaki Fukuda, Suvi Haukka | 2018-02-27 |
| 9875893 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2018-01-23 |
| 9818601 | Substrate processing apparatus and method of processing substrate | Masaki Tokunaga, Masaru Zaitsu | 2017-11-14 |
| 9812319 | Method for forming film filled in trench without seam or void | Hideaki Fukuda | 2017-11-07 |
| 9754779 | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | Dai Ishikawa | 2017-09-05 |
| 9627221 | Continuous process incorporating atomic layer etching | Masaru Zaitsu, Hideaki Fukuda | 2017-04-18 |
| 9564314 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2017-02-07 |
| 9564309 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Hideaki Fukuda, Suvi Haukka | 2017-02-07 |
| 9455138 | Method for forming dielectric film in trenches by PEALD using H-containing gas | Hideaki Fukuda, Noboru Takamure, Masaru Zaitsu | 2016-09-27 |
| 9396956 | Method of plasma-enhanced atomic layer etching | — | 2016-07-19 |
| 9368352 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2016-06-14 |
| 9343297 | Method for forming multi-element thin film constituted by at least five elements by PEALD | Hideaki Fukuda | 2016-05-17 |
| 9153441 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2015-10-06 |
| 9142393 | Method for cleaning reaction chamber using pre-cleaning process | Tatsuhiro Okabe | 2015-09-22 |
| 9023737 | Method for forming conformal, homogeneous dielectric film by cyclic deposition and heat treatment | Julien Beynet, Ivo Raaijmakers | 2015-05-05 |
| 8912101 | Method for forming Si-containing film using two precursors by ALD | Naoto Tsuji, Noboru Takamure, Suvi Haukka, Antti Niskanen, Hyung Sang Park | 2014-12-16 |
| 8784950 | Method for forming aluminum oxide film using Al compound containing alkyl group and alkoxy or alkylamine group | Hideaki Fukuda | 2014-07-22 |
| 8784951 | Method for forming insulation film using non-halide precursor having four or more silicons | Hideaki Fukuka | 2014-07-22 |
| 8765233 | Method for forming low-carbon CVD film for filling trenches | Hisashi Tazawa, Shigeyuki Onizawa | 2014-07-01 |
| 8722546 | Method for forming silicon-containing dielectric film by cyclic deposition with side wall coverage control | Takahiro Oka | 2014-05-13 |
| 8679958 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2014-03-25 |