Issued Patents All Time
Showing 51–75 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8647722 | Method of forming insulation film using plasma treatment cycles | Akiko Kobayashi, Akira Shimizu, Kuo-wei Hong, Nobuyoshi Kobayashi | 2014-02-11 |
| 8563443 | Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen | — | 2013-10-22 |
| 8329599 | Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen | Noboru Takamure | 2012-12-11 |
| 8241991 | Method for forming interconnect structure having airgap | Julian J. Hsieh, Nobuyoshi Kobayashi, Akira Shimizu, Kiyohiro Matsushita | 2012-08-14 |
| 8080282 | Method for forming silicon carbide film containing oxygen | Manabu Kato, Nobuo Matsuki | 2011-12-20 |
| 8003174 | Method for forming dielectric film using siloxane-silazane mixture | Woo Jin Lee, Nobuo Matsuki | 2011-08-23 |
| 7919416 | Method of forming conformal dielectric film having Si-N bonds by PECVD | Woo Jin Lee, Akira Shimizu | 2011-04-05 |
| 7842622 | Method of forming highly conformal amorphous carbon layer | Woo Jin Lee | 2010-11-30 |
| 7825040 | Method for depositing flowable material using alkoxysilane or aminosilane precursor | Hisashi Tazawa, Jeongseok Ha, Shintaro Ueda | 2010-11-02 |
| 7781352 | Method for forming inorganic silazane-based dielectric film | Nobuo Matsuki, Jeongseok Ha | 2010-08-24 |
| 7718553 | Method for forming insulation film having high density | Nobuo Matsuki | 2010-05-18 |
| 7655577 | Method of forming silicon-containing insulation film having low dielectric constant and low film stress | Yasuyoshi Hyodo, Nobuo Matsuki, Masashi Yamaguchi, Naoki Ohara, Yijun Liu | 2010-02-02 |
| 7651959 | Method for forming silazane-based dielectric film | Jeongseok Ha, Nobuo Matsuki | 2010-01-26 |
| 7622369 | Device isolation technology on semiconductor substrate | Woo Jin Lee, Nobuo Matsuki | 2009-11-24 |
| 7582575 | Method for forming insulation film | Kenichi Kagami | 2009-09-01 |
| 7560144 | Method of stabilizing film quality of low-dielectric constant film | Kiyoto Itoh, Tsunayuki Kimura, Nobuo Matsuki | 2009-07-14 |
| 7354873 | Method for forming insulation film | Nobuo Matsuki, Seijiro Umemoto | 2008-04-08 |
| 7229935 | Method of forming a thin film by plasma CVD of a silicon-containing source gas | Kenichi Kagami, Manabu Kato | 2007-06-12 |
| 7148154 | Method of forming silicon-containing insulation film having low dielectric constant and low film stress | Yasuyoshi Hyodo, Nobuo Matsuki, Masashi Yamaguchi, Naoki Ohara, Yijun Liu | 2006-12-12 |
| 7147900 | Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation | Naoto Tsuji, Nobuo Matsuki, Shingo Ikeda | 2006-12-12 |
| 7064088 | Method for forming low-k hard film | Yasuyoshi Hyodo, Yoshinori Morisada, Masashi Yamaguchi, Nobuo Matsuki | 2006-06-20 |
| 7012268 | Gas-shield electron-beam gun for thin-film curing application | Nobuo Matsuki, Naoto Tsuji | 2006-03-14 |
| 6881683 | Insulation film on semiconductor substrate and method for forming same | Nobuo Matsuki, Yasuyoshi Hyodo, Masashi Yamaguchi, Yoshinori Morisada, Manabu Kato +3 more | 2005-04-19 |
| 6852650 | Insulation film on semiconductor substrate and method for forming same | Nobuo Matsuki, Yasuyoshi Hyodo, Masashi Yamaguchi, Yoshinori Morisada, Manabu Kato | 2005-02-08 |
| 6818570 | Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength | Naoto Tsuji, Yukihiro Mori, Satoshi Takahashi, Kiyohiro Matsushita, Michael A. Todd | 2004-11-16 |