Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9190263 | Method for forming SiOCH film using organoaminosilane annealing | Dai Ishikawa, Kiyohiro Matsushita, Akinori Nakano, Hirofumi Arai | 2015-11-17 |
| 9117657 | Method for filling recesses using pre-treatment with hydrocarbon-containing gas | Akinori Nakano | 2015-08-25 |
| 9029272 | Method for treating SiOCH film with hydrogen plasma | Akinori Nakano, Dai Ishikawa, Kiyohiro Matsushita | 2015-05-12 |
| 8592005 | Atomic layer deposition for controlling vertical film growth | — | 2013-11-26 |
| 8465811 | Method of depositing film by atomic layer deposition with pulse-time-modulated plasma | — | 2013-06-18 |
| 7825040 | Method for depositing flowable material using alkoxysilane or aminosilane precursor | Atsuki Fukazawa, Hisashi Tazawa, Jeongseok Ha | 2010-11-02 |