YM

Yoshinori Morisada

AK Asm Japan K.K.: 17 patents #4 of 128Top 4%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #204,223 of 4,157,543Top 5%
21
Patents All Time

Issued Patents All Time

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
12060635 Hard mask, substrate processing method, and substrate processing apparatus Tsuyoshi Moriya, Tadahiro Ishizaka 2024-08-13
11993849 Carbon hard mask, film forming apparatus, and film forming method Masaru Hori, Makoto Sekine, Hirotsugu Sugiura, Tsuyoshi Moriya, Satoshi Tanaka 2024-05-28
9708507 Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method Kippei Sugita, Tatsuya Yamaguchi, Makoto Fujikawa 2017-07-18
9422452 Polymerized film forming method Tatsuya Yamaguchi 2016-08-23
7799134 Shower plate having projections and plasma CVD apparatus using same Naoto Tsuji, Hideaki Fukuda, Hiroki Arai, Tamihiro Kobayashi 2010-09-21
7638441 Method of forming a carbon polymer film using plasma CVD Nobuo Matsuki, Kamal Kishore Goundar 2009-12-29
7504344 Method of forming a carbon polymer film using plasma CVD Nobuo Matsuki, Seijiro Umemoto, Jea Sik Lee 2009-03-17
7470633 Method of forming a carbon polymer film using plasma CVD Nobuo Matsuki, Seijiro Umemoto, Jea Sik Lee 2008-12-30
7410915 Method of forming carbon polymer film using plasma CVD Kamal Kishore Goundar, Masashi Yamaguchi, Nobuo Matsuki, Kyu-Tae Na, Eun-Kyung Baek 2008-08-12
7381291 Dual-chamber plasma processing apparatus Yasuhiro Tobe, Shingo Ikeda, Baiei Kawano 2008-06-03
7064088 Method for forming low-k hard film Yasuyoshi Hyodo, Atsuki Fukazawa, Masashi Yamaguchi, Nobuo Matsuki 2006-06-20
6881683 Insulation film on semiconductor substrate and method for forming same Nobuo Matsuki, Yasuyoshi Hyodo, Masashi Yamaguchi, Atsuki Fukazawa, Manabu Kato +3 more 2005-04-19
6852650 Insulation film on semiconductor substrate and method for forming same Nobuo Matsuki, Yasuyoshi Hyodo, Masashi Yamaguchi, Atsuki Fukazawa, Manabu Kato 2005-02-08
6784123 Insulation film on semiconductor substrate and method for forming same Nobuo Matsuki, Yasuyoshi Hyodo, Seijiro Umemoto 2004-08-31
6759344 Method for forming low dielectric constant interlayer insulation film Nobuo Matsuki, Atsuki Fukazawa, Manabu Kato 2004-07-06
6740367 Plasma CVD film-forming device Nobuo Matsuki 2004-05-25
6631692 Plasma CVD film-forming device Nobuo Matsuki 2003-10-14
6559520 Siloxan polymer film on semiconductor substrate Nobuo Matsuki, Lee Jea Sik, Satoshi Takahashi 2003-05-06
6514880 Siloxan polymer film on semiconductor substrate and method for forming same Nobuo Matsuki, Lee Jea Sik, Satoshi Takahashi 2003-02-04
6383955 Silicone polymer insulation film on semiconductor substrate and method for forming the film Nobuo Matsuki, Yuichi Naito, Aya Matsunoshita 2002-05-07
6352945 Silicone polymer insulation film on semiconductor substrate and method for forming the film Nobuo Matsuki, Yuichi Naito, Aya Matsunoshita 2002-03-05