KN

Kyu-Tae Na

Samsung: 15 patents #9,125 of 75,807Top 15%
AK Asm Japan K.K.: 1 patents #77 of 128Top 65%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
📍 Seoul, NY: #53 of 112 inventorsTop 50%
Overall (All Time): #299,216 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
8673723 Methods of forming isolation regions for FinFET semiconductor devices 2014-03-18
8563429 Methods of forming a metal silicide layer for semiconductor devices Won-Goo Hur, Min Jung Kim, Hyun-Young Kim, Je-Hyeon Park 2013-10-22
8237240 Isolation layer structure, method of forming the same and method of manufacturing a semiconductor device including the same Ju-Wan Kim, Min Jung Kim, Seung-bae Park, Il-Woo Kim, Dae Young Kwak 2012-08-07
8017495 Method of forming isolation layer structure and method of manufacturing a semiconductor device including the same Ju-Wan Kim, Min-seon Kim, Seung-bae Park, Il-Woo Kim, Dae Young Kwak 2011-09-13
7745305 Method of removing an oxide and method of filling a trench using the same Seung Heon Lee, Ju-Wan Kim, Taek Kim 2010-06-29
7601588 Method of forming a trench isolation layer and method of manufacturing a non-volatile memory device using the same Jong Wan Choi, Hong-Gun Kim, Eunkee Hong 2009-10-13
7598177 Methods of filling trenches using high-density plasma deposition (HDP) Yong-Won Cha 2009-10-06
7585786 Methods of forming spin-on-glass insulating layers in semiconductor devices and associated semiconductor device Juseon Goo, Eunkee Hong, Hong-Gun Kim 2009-09-08
7560383 Method of forming a thin layer and method of manufacturing a non-volatile semiconductor device using the same Kyong-Hee Joo, Yong-Won Cha, Seung Hyun Lim, In-Seok Yeo 2009-07-14
7534698 Methods of forming semiconductor devices having multilayer isolation structures Hong-Gun Kim, Eunkee Hong 2009-05-19
7517817 Method for forming a silicon oxide layer using spin-on glass Ju-Seon Goo, Eun-Kee Hong, Hong-Gun Kim 2009-04-14
7410915 Method of forming carbon polymer film using plasma CVD Yoshinori Morisada, Kamal Kishore Goundar, Masashi Yamaguchi, Nobuo Matsuki, Eun-Kyung Baek 2008-08-12
7358190 Methods of filling gaps by deposition on materials having different deposition rates Hong-Gun Kim, Eun-Kee Hong, Ju-Seon Goo 2008-04-15
7332409 Methods of forming trench isolation layers using high density plasma chemical vapor deposition Yong-Won Cha, Yong-Soon Choi, Eunkee Hong, Ju-Seon Goo 2008-02-19
7192891 Method for forming a silicon oxide layer using spin-on glass Ju-Seon Goo, Eun-Kee Hong, Hong-Gun Kim 2007-03-20
7056827 Methods of filling trenches using high-density plasma deposition (HDP) Yong-Won Cha 2006-06-06