| 12049714 |
Metal nanoparticles impregnated activated carbon fiber for removing harmful substances, and method of manufacturing same |
Seung Kon Ryu |
2024-07-30 |
| 11753722 |
Method of preparing nanocomposite material plated with network-type metal layer through silica self-cracks and wearable electronics carbon fiber prepared therefrom |
Hun Jeong, Leeku Kwac, Seonghun Back, Bobby Singh Soram |
2023-09-12 |
| 11626476 |
Semiconductor device including a plurality of electrodes and supporters |
Ha-young Yi, Youn-seok Choi, Young-min Ko, Mun-jun Kim, Seung Heon Lee |
2023-04-11 |
| 10879345 |
Semiconductor device including a plurality of electrodes and supporters |
Ha-young Yi, Youn-seok Choi, Young-min Ko, Mun-jun Kim, Seung Heon Lee |
2020-12-29 |
| 10490623 |
Semiconductor device including a plurality of electrodes and supporters |
Ha-young Yi, Youn-seok Choi, Young-min Ko, Mun-jun Kim, Seung Heon Lee |
2019-11-26 |
| 10170541 |
Semiconductor device including a plurality of electrodes and supporters |
Ha-young Yi, Youn-seok Choi, Young-min Ko, Mun-jun Kim, Seung Heon Lee |
2019-01-01 |
| 9627469 |
Oxide film, integrated circuit device, and methods of forming the same |
Ha-young Yi, Jun Won Lee, Byoung-Deog Choi, Jong-Myeong Lee, Mun-jun Kim |
2017-04-18 |
| 9263536 |
Methods of fabricating semiconductor devices with electrode support patterns |
Young-min Ko, Kwang-Tae Hwang |
2016-02-16 |
| 9142610 |
Semiconductor device including supporters on a lower electrode thereof and method of fabricating the same |
Kwang-Tae Hwang, Young-min Ko |
2015-09-22 |
| 8530329 |
Methods of fabricating semiconductor devices having various isolation regions |
Yong-Soon Choi, Jun Won Lee, Gil-Heyun Choi, Eun-Kee Hong, Ha-young Yi |
2013-09-10 |
| 7867924 |
Methods of reducing impurity concentration in isolating films in semiconductor devices |
Jong Wan Choi, Eun-Kyung Baek, Sang-Hoon Ahn, Dong-Chul SUH, Yong-Soon Choi |
2011-01-11 |
| 7842569 |
Flash memory device and method of fabricating the same |
Ju-Seon Goo, Mun-jun Kim, Yong-Soon Choi, Sung Tae Kim, Eun-Kyung Baek |
2010-11-30 |
| 7674685 |
Semiconductor device isolation structures and methods of fabricating such structures |
Jong Wan Choi, Ju-Seon Goo, Yong-Soon Choi, Sung Tae Kim, Eun-Kyung Baek |
2010-03-09 |
| 7601588 |
Method of forming a trench isolation layer and method of manufacturing a non-volatile memory device using the same |
Jong Wan Choi, Kyu-Tae Na, Eunkee Hong |
2009-10-13 |
| 7585786 |
Methods of forming spin-on-glass insulating layers in semiconductor devices and associated semiconductor device |
Juseon Goo, Eunkee Hong, Kyu-Tae Na |
2009-09-08 |
| 7534698 |
Methods of forming semiconductor devices having multilayer isolation structures |
Eunkee Hong, Kyu-Tae Na |
2009-05-19 |
| 7517817 |
Method for forming a silicon oxide layer using spin-on glass |
Ju-Seon Goo, Eun-Kee Hong, Kyu-Tae Na |
2009-04-14 |
| 7429637 |
Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same |
Eunkee Hong, Kyutae Na, Juseon Goo |
2008-09-30 |
| 7358190 |
Methods of filling gaps by deposition on materials having different deposition rates |
Kyu-Tae Na, Eun-Kee Hong, Ju-Seon Goo |
2008-04-15 |
| 7192891 |
Method for forming a silicon oxide layer using spin-on glass |
Ju-Seon Goo, Eun-Kee Hong, Kyu-Tae Na |
2007-03-20 |
| 7015144 |
Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same |
Eunkee Hong, Kyutae Na, Juseon Goo |
2006-03-21 |
| 6774048 |
Method of manufacturing a semiconductor device |
Eun-Kyung Baek, Sun-Hoo Park, Kyung Joong YOON |
2004-08-10 |
| 6645879 |
Method of forming a silicon oxide layer of a semiconductor device and method of forming a wiring having the same |
Eun-Kee Hong, Ju-Bum Lee, Ju-Seon Goo, Myeong-Cheol Kim |
2003-11-11 |
| 6635586 |
Method of forming a spin-on-glass insulation layer |
Ju-Seon Goo, Eun-Kee Hong, Jin-Gi Hong |
2003-10-21 |
| 6566229 |
Method of forming an insulating layer in a trench isolation type semiconductor device |
Soo-Jin Hong, Moon-han Park, Ju-Seon Goo, Jin-Hwa Heo, Eun-Kee Hong |
2003-05-20 |
